Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …
Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …
realizable complementary tool to aid optical patterning of device elements for future …
Nanopatterning via solvent vapor annealing of block copolymer thin films
The self-assembly of block copolymers to generate nanopatterns is of great interest as an
inexpensive approach to sub-20 nm lithography. Compared to thermal annealing, solvent …
inexpensive approach to sub-20 nm lithography. Compared to thermal annealing, solvent …
Rapid ordering of block copolymer thin films
PW Majewski, KG Yager - Journal of Physics: Condensed Matter, 2016 - iopscience.iop.org
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be
finely tuned via block architecture and processing conditions. However, the ultimate usage …
finely tuned via block architecture and processing conditions. However, the ultimate usage …
Solvothermal annealing of block copolymer thin films
KW Gotrik, CA Ross - Nano letters, 2013 - ACS Publications
A two-stage annealing process for block copolymer films was introduced consisting of a
solvent vapor exposure followed by a thermal cycle. By heating the film but not the chamber …
solvent vapor exposure followed by a thermal cycle. By heating the film but not the chamber …
Flash light millisecond self‐assembly of high χ block copolymers for wafer‐scale sub‐10 nm nanopatterning
One of the fundamental challenges encountered in successful incorporation of directed self‐
assembly in sub‐10 nm scale practical nanolithography is the process compatibility of block …
assembly in sub‐10 nm scale practical nanolithography is the process compatibility of block …
Shape-anisotropic diblock copolymer particles from evaporative emulsions: Experiment and theory
Self-assembly of block copolymers (BCPs) in evaporative emulsion provides a simple and
effective route for the preparation of anisotropic particles with controlled shape and size …
effective route for the preparation of anisotropic particles with controlled shape and size …
Solvent-assisted self-assembly of block copolymer thin films
P Pula, A Leniart, PW Majewski - Soft Matter, 2022 - pubs.rsc.org
Solvent-assisted block copolymer self-assembly is a compelling method for processing and
advancing practical applications of these materials due to the exceptional level of the control …
advancing practical applications of these materials due to the exceptional level of the control …
Realizing 5.4 nm full pitch lamellar microdomains by a solid-state transformation
A simple method was developed to realize a self-assembled block copolymer (BCP)
lamellar microdomain morphology with a full pitch of 5.4 nm through an acid hydrolysis of …
lamellar microdomain morphology with a full pitch of 5.4 nm through an acid hydrolysis of …
Deconvoluting the mechanism of microwave annealing of block copolymer thin films
The self-assembly of block copolymer (BCP) thin films is a versatile method for producing
periodic nanoscale patterns with a variety of shapes. The key to attaining a desired pattern …
periodic nanoscale patterns with a variety of shapes. The key to attaining a desired pattern …