Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future …
The self-assembly of block copolymers to generate nanopatterns is of great interest as an inexpensive approach to sub-20 nm lithography. Compared to thermal annealing, solvent …
PW Majewski, KG Yager - Journal of Physics: Condensed Matter, 2016 - iopscience.iop.org
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage …
KW Gotrik, CA Ross - Nano letters, 2013 - ACS Publications
A two-stage annealing process for block copolymer films was introduced consisting of a solvent vapor exposure followed by a thermal cycle. By heating the film but not the chamber …
HM Jin, DY Park, SJ Jeong, GY Lee, JY Kim… - Advanced …, 2017 - Wiley Online Library
One of the fundamental challenges encountered in successful incorporation of directed self‐ assembly in sub‐10 nm scale practical nanolithography is the process compatibility of block …
Self-assembly of block copolymers (BCPs) in evaporative emulsion provides a simple and effective route for the preparation of anisotropic particles with controlled shape and size …
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control …
A simple method was developed to realize a self-assembled block copolymer (BCP) lamellar microdomain morphology with a full pitch of 5.4 nm through an acid hydrolysis of …
The self-assembly of block copolymer (BCP) thin films is a versatile method for producing periodic nanoscale patterns with a variety of shapes. The key to attaining a desired pattern …