Oxide and nitride thin-films of Ti, Hf, and Si serve numerous applications owing to the
diverse range of their material properties. It is therefore imperative to have proper control …

Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …

Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …

Antireflection (AR) coatings are indispensable in numerous optical applications and are
increasingly demanded on highly curved optical components. In this work, optical thin films …

HfO_2 has promising applications in semiconductors and optics due to its high dielectric
constant and high refractive index. In this work, HfO_2 thin films were deposited by plasma …

A novel broadband antireflective coating with ultra-low residual reflectance for light
incidence angles from 0° up to 60° is presented. The system consists of an interference …

Ultra-thin metallic films are widely applied in optics and microelectronics. However, their
properties differ significantly from the bulk material and depend on the substrate material …

Infrared (IR) antireflective and protective coating (ARPC) is crucial for the development of IR
precision guidance and detection systems for practical applications, attracting significant …

We report for the first time the direct growth of molybdenum disulfide (MoS2) monolayers on
nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of …

The structural, optical, and mechanical properties of TiO 2 nanolaminate films grown by
plasma-enhanced atomic layer deposition are discussed. Several TiO 2/Al 2 O 3 and TiO …