Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial
applications, primarily attributed to their excellent properties. Among the different methods …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

The ionization region model (IRM) is applied to model high power impulse magnetron
sputtering (HiPIMS) discharges with a Cu target. We apply the model to three discharges …

Amorphous carbon films were deposited by bipolar HiPIMS, as a function of negative and
positive voltage pulse lengths (50-175 μs and 0-175 μs respectively), using argon as sputter …

The angular dependence of the deposition rates due to ions and neutrals in high-power
impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined …

PVD technologies, including vacuum arc evaporation and DC-magnetron sputtering, have
been utilized in industrial settings since the early 1980s for depositing protective coatings …

The influence of pulse length, working gas pressure, and peak discharge current density on
the deposition rate and ionised flux fraction in high power impulse magnetron sputtering …

Three experiments on a dual magnetron sputtering system capable of providing a pulse
power density of> 1 kW/cm 2, pulse repetition frequency of> 10 4 Hz, and pulse duration of> …

In this work, the influence of different pulse widths (25, 50 and 100 μs) during high power
impulse magnetron sputtering (HiPIMS) of copper, silver and zirconium was investigated in …

Growth temperature (T s) and ion irradiation energy (E i) are important factors that influence
film growth as well as their properties. In this study, we investigate the evolution of crystal …