Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
T Lafleur - Plasma Sources Science and Technology, 2015 - iopscience.iop.org
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
eduPIC: an introductory particle based code for radio-frequency plasma simulation
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …
swarms and low-temperature plasma sources. The main advantage of such approaches is …
Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
The ionization dynamics in geometrically symmetric parallel plate capacitively coupled
plasmas driven by radio frequency tailored voltage waveforms is investigated using phase …
plasmas driven by radio frequency tailored voltage waveforms is investigated using phase …
The role of electron induced secondary electron emission from SiO2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures
The effects of electron induced secondary electron (SE) emission from SiO 2 electrodes in
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas
We investigate the effects of secondary electrons (SEs), induced by electrons impinging on
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas
In most PIC/MCC simulations of radio frequency capacitively coupled plasmas (CCPs)
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges
The electron power absorption dynamics and plasma uniformity in low pressure capacitively
coupled RF discharges with structured electrodes are investigated by graphics processing …
coupled RF discharges with structured electrodes are investigated by graphics processing …
The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single-and dual-frequency …
In particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations of capacitively coupled
plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in …
plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in …
2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
Control of electron velocity distributions at the wafer by tailored voltage waveforms in capacitively coupled plasmas to compensate surface charging in high-aspect …
P Hartmann, L Wang, K Nösges, B Berger… - Journal of Physics D …, 2021 - iopscience.iop.org
Low pressure single-or dual-frequency capacitively coupled radio frequency (RF) plasmas
are frequently used for high-aspect ratio (HAR) dielectric etching due to their capability to …
are frequently used for high-aspect ratio (HAR) dielectric etching due to their capability to …