Chemical sensing applications of ZnO nanomaterials
Recent advancement in nanoscience and nanotechnology has witnessed numerous
triumphs of zinc oxide (ZnO) nanomaterials due to their various exotic and multifunctional …
triumphs of zinc oxide (ZnO) nanomaterials due to their various exotic and multifunctional …
Performance variation with pristine and doped high‐k materials via atomic layer deposition
ES Jung, JU Yoo, TM Choi, HR Lee… - … Journal of Applied …, 2024 - Wiley Online Library
This review examines the performance variations of pristine and doped high‐k materials
deposited using atomic layer deposition (ALD). This paper explores the fundamental …
deposited using atomic layer deposition (ALD). This paper explores the fundamental …
[HTML][HTML] Capacitance–Voltage Fluctuation of SixNy-Based Metal–Insulator–Metal Capacitor Due to Silane Surface Treatment
TM Choi, ES Jung, JU Yoo, HR Lee, SG Pyo - Micromachines, 2024 - pmc.ncbi.nlm.nih.gov
In this study, we analyze metal–insulator–metal (MIM) capacitors with different thicknesses
of SixNy film (650 Å, 500 Å, and 400 Å) and varying levels of film quality to improve their …
of SixNy film (650 Å, 500 Å, and 400 Å) and varying levels of film quality to improve their …
Effect of barrier layer thickness on AlGaN/GaN double gate MOS-HEMT device performance for high-frequency application
In this work, we have examined the effect of the AlGaN barrier layer thickness (db) of 0.5 μm
gate length AlGaN/GaN heterostructure double gate (DG) MOS-HEMT device using 2D Atlas …
gate length AlGaN/GaN heterostructure double gate (DG) MOS-HEMT device using 2D Atlas …
Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer …
J Li, J Wu, J Liu, J Sun - Nanoscale Research Letters, 2019 - Springer
Abstracts Nanolayered Ta 2 O 5-Al 2 O 3 composite films were grown on n-type silicon by
atomic layer deposition (ALD) within the overlapped ALD window of 220–270° C. Moreover …
atomic layer deposition (ALD) within the overlapped ALD window of 220–270° C. Moreover …
[PDF][PDF] Designing and optimization of plasmonic modulator structure based on the active materials of ITO and graphene
A Eslami, M Sadeghi, Z Adelpour - J. Intell. Proc. Electric. Technol., 2023 - jipet.iaun.iau.ir
In the last decade, optical integrated circuits, including modulators, have made significant
progress in optical communications, imaging, and sensors. Among the active materials used …
progress in optical communications, imaging, and sensors. Among the active materials used …
طراحی و بهینه سازی ساختار مدولاتور پلاسمونیکی مبتنی بر ماده فعال ITO وگرافن
اسلامی, صادقی, عادل پور - روش‌های هوشمند در صنعت برق, 2023 - journals.iau.ir
در یک دهه اخیر مدارهای مجتمع نوری مانند مدولاتورها، پیشرفت چشمگیری در زمینه‌های مختلف مانند
مخابرات نوری، تصویربرداری و سنسور داشته‌اند. از میان مواد فعال مورد استفاده در مدولاتورها …
مخابرات نوری، تصویربرداری و سنسور داشته‌اند. از میان مواد فعال مورد استفاده در مدولاتورها …