A growing literature within the field of chemical engineering describing the use of artificial
neural networks (ANN) has evolved for a diverse range of engineering applications such as …

Advances in modeling and control will be required to meet future technical challenges in
microelectronics manufacturing. The implementation of closed-loop control on key unit …

Progress in the technology of submicron semiconductor device, which makes a short-
channel and quantum effects, having equations of nonlinear modelling, leads to complicated …

Abstract Quantum-dot Cellular Automata (QCA) is one of the emerging nanotechnologies,
promising an alternative to CMOS technology due to a faster speed, smaller size, lower …

In this paper, a neural network approach is used to understand the effects of fabric features
and plasma processing parameters on fabric surface wetting properties. In this approach …

Electron cyclotron resonance (ECR) plasma etching of silicon carbide is numerically
modeled by a feedforward neural network (FNN), which is trained by the Broyden, Fletcher …

Concerns optical measurement techniques for semiconductor manufacturing process
monitoring and control. They can provide previously impossible real-time monitoring of …

This paper presents a tool for the real-time diagnosis of integrated circuit fabrication
equipment. The approach focuses on integrating neural networks into an expert system. The …

Silicon oxide (SiO/sub 2/) films have extensive applications in integrated circuit fabrication
technology, including passivation layers for integrated circuits, diffusion or photolithographic …

A numerical model for the deposition of silicon nitride using silane and ammonia mixture in a
radio frequency plasma reactor has been developed. Plasma enhanced chemical vapor …