Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
S Arvind, EW Larsen, P Bezard, J Petersen… - Journal of Vacuum …, 2024 - pubs.aip.org
State-of-the-art extreme ultraviolet lithography requires the use of ultrathin photoresists (or
resists) due to pattern stability concerns and reduced depth of focus of the extreme …
resists) due to pattern stability concerns and reduced depth of focus of the extreme …
Molecular glass resist performance for nano-pattern transfer
Z El Otell, A Ringk, T Kolb, C Neuber… - … Etch Technology for …, 2015 - spiedigitallibrary.org
The performance of novel molecular glass resists is demonstrated in this work for the
purposes of performing nano-pattern transfer. In order to improve the etch durability, post …
purposes of performing nano-pattern transfer. In order to improve the etch durability, post …