Luminescence properties of defects in GaN

MA Reshchikov, H Morkoç - Journal of applied physics, 2005 - pubs.aip.org
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds
have gained an unprecedented attention due to their wide-ranging applications …

Substrates for gallium nitride epitaxy

L Liu, JH Edgar - Materials Science and Engineering: R: Reports, 2002 - Elsevier
In this review, the structural, mechanical, thermal, and chemical properties of substrates
used for gallium nitride (GaN) epitaxy are compiled, and the properties of GaN films …

[图书][B] The blue laser diode: GaN based light emitters and lasers

S Nakamura, G Fasol - 2013 - books.google.com
Shuji Nakamura's development of commercial light emitters from Gallium Nitride and related
materials has recently propelled these materials into the mainstream of interest. It is very …

The blue laser diode. The complete story

S Nakamura, S Pearton, G Fasol - Measurement Science and …, 2001 - iopscience.iop.org
The story of Shuji Nakamura and the blue laser diode is remarkable. It is clear from this book
that he enjoys this fact and wishes his readers to become familiar with his success …

[PDF][PDF] Thick GaN epitaxial growth with low dislocation density by hydride vapor phase epitaxy

A Usui, H Sunakawa, A Sakai… - … JOURNAL OF APPLIED …, 1997 - researchgate.net
1. Introduction Recently, blue-or ultraviolet-light-emitting lasers have been developed using
GaN and InGaN-based compound semiconductors.*** These device structures have been …

Properties of strained wurtzite GaN and AlN: Ab initio studies

JM Wagner, F Bechstedt - Physical Review B, 2002 - APS
The structural, dielectric, lattice-dynamical, and electronic properties of biaxially and
uniaxially strained group-III nitrides are studied ab initio using a pseudopotential-plane …

Group III nitride semiconductors for short wavelength light-emitting devices

JW Orton, CT Foxon - Reports on progress in physics, 1998 - iopscience.iop.org
The group III nitrides (AlN, GaN and InN) represent an important trio of semiconductors
because of their direct band gaps which span the range 1.95-6.2 eV, including the whole of …

The effect of the III/V ratio and substrate temperature on the morphology and properties of GaN-and AlN-layers grown by molecular beam epitaxy on Si (1 1 1)

MA Sanchez-Garcia, E Calleja, E Monroy… - Journal of crystal …, 1998 - Elsevier
We have studied the effect of the III/V ratio and substrate temperature on the growth of GaN
and A1N films on Si (1 1 1) substrates by molecular beam epitaxy, where active nitrogen …

Luminescence properties and defects in GaN nanocolumns grown by molecular beam epitaxy

E Calleja, MA Sánchez-García, FJ Sánchez, F Calle… - Physical Review B, 2000 - APS
Wurtzite GaN nanocolumns are reproducibly grown by plasma-assisted molecular beam
epitaxy on Si (111) and c-sapphire substrates. The nanocolumns density and diameter (600 …

Electronic band structures and effective-mass parameters of wurtzite GaN and InN

YC Yeo, TC Chong, MF Li - Journal of applied physics, 1998 - pubs.aip.org
The electronic band structures of wurtzite GaN and InN are calculated by the empirical
pseudopotential method (EPM) with the form factors adjusted to reproduce band features …