Since the middle of the 1990s, X-ray phase imaging including phase tomography has been
attracting increasing attention. The advantage of X-ray phase imaging is that an extremely …

X-ray interferometry for imaging applications is discussed with a review of X-ray
interferometric imaging activities reported to date. Phase measurement and phase …

This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

Optical methods that provide high diffraction image quality with a spatial resolution of
several to tens of nanometers and are in demand in such areas as projection lithography, X …

The main problems and the approach used by the authors for roughness metrology of super-
smooth surfaces designed for diffraction-quality X-ray mirrors are discussed. The limitations …

A new phase-shifting interferometry analysis technique has been developed to overcome
the errors introduced by nonlinear, irregular, or unknown phase-step increments. In the …

We report, for the first time to our knowledge, experimental demonstration of wave-front
analysis via the Hartmann technique in the extreme ultraviolet range. The reference wave …

A point diffraction interferometer (PDI) for extreme ultraviolet lithography (EUVL) aspheric
mirror measurement has been developed. In order to realize an accuracy of 0.1 nm rms …

Problems in the application of a null lens for surface shape measurements of aspherical
mirrors are discussed using the example of manufacturing an aspherical concave mirror for …

Parallel two-step phase-shifting point-diffraction interferometry for microscopy based on a
pair of cube beamsplitters is proposed. The first 45°-tilted cube beamsplitter splits object …