2022 review of data-driven plasma science

R Anirudh, R Archibald, MS Asif… - … on Plasma Science, 2023 - ieeexplore.ieee.org
Data-driven science and technology offer transformative tools and methods to science. This
review article highlights the latest development and progress in the interdisciplinary field of …

Machine learning for advancing low-temperature plasma modeling and simulation

J Trieschmann, L Vialetto… - Journal of Micro …, 2023 - spiedigitallibrary.org
Machine learning has had an enormous impact in many scientific disciplines. It has also
attracted significant interest in the field of low-temperature plasma (LTP) modeling and …

[HTML][HTML] Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

S Park, Y Park, J Seong, H Lee, N Bae, K Roh… - Physics of …, 2024 - pubs.aip.org
Meter-scale of the large area inductively coupled plasma etchers with the capacitive power
coupling are widely applied for the mass production of OLED (organic light emitting diode) …

Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM

S Park, J Seong, Y Park, Y Noh, H Lee… - Plasma Physics and …, 2024 - iopscience.iop.org
The production efficiencies of organic light emitting diode (OLED) displays and
semiconductor manufacturing have been dramatically improving with the help of plasma …

Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate

N Bae, NK Kim, H Lee, Y Jang, S Park, GH Kim - Current Applied Physics, 2024 - Elsevier
This study investigated the effect of plasma charging of the dielectric materials on the
floating sheath distribution. The sheath measurements were conducted with two targets with …

[HTML][HTML] Preface to Special Topic “Plasma Physics and Science in Current and Next Generation Semiconductor Process”: Invited papers from The 8th International …

HC Lee - Physics of Plasmas, 2022 - pubs.aip.org
In semiconductor plasma processing, there are huge emerging issues related to the
shrinking critical dimension (CD) and the next generation three-dimensional (3D) device …