The deposition of thick B 4 C films with low residual stress by conventional direct-current
magnetron sputtering is accompanied by the formation of dust particulates contaminating the …

Magnetron sputter deposition is an enabling technology for laser target fabrication. Solutions
are readily available for the deposition of most sub-micron-thick elemental films on planar …

Sputter deposition of B 4 C films with tailored physical properties remains a challenge. Here,
we systematically study how substrate temperature influences the properties of B 4 C films …

Boron carbide is an attractive ablator for next-generation inertial confinement fusion (ICF)
targets. Here we describe several aspects of our ongoing systematic studies of the …

Conventional magnetron sputter deposition of B4C uses Ar as the working gas. Here, we
explore the magnetron sputter deposition of B4C with a Ne plasma, which is expected to …

SnO2 thin films were prepared by conventional and Glancing Angle Deposition reactive
sputtering, and their gas sensing properties were investigated. The porosity of the as …

In view of the demand for high-quality thermal neutron detectors, boron films have recently
attracted widespread research interest because of their special properties. In this work, we …

Most designs of inertial confinement fusion (ICF) targets require ablators in the form of
hollow spherical shells with an outer diameter of∼ 1− 3 mm and a wall thickness of∼ 20 …

Boron carbide coatings deposited by sputtering with conventional planar magnetrons exhibit
nodular growth defects. Here, we demonstrate that the density of nodular defects in B 4 C …

Im Rahmen der vorgestellten Ergebnisse wird das Potential von dünnen Borkarbid-
Schichten (B4C) hinsichtlich tribologischer Anwendungen untersucht. Dafür werden …