Challenges in material processing and reliability issues in AlGaN/GaN HEMTs on silicon wafers for future RF power electronics & switching applications: A critical …

J Ajayan, D Nirmal, P Mohankumar, B Mounika… - Materials Science in …, 2022 - Elsevier
In order to handle high power with good thermal stability at RF & microwave frequencies
wider bandgap semiconductor based transistors are highly desirable and GaN & AlGaN …

GaN HEMTs on Si with regrown contacts and cutoff/maximum oscillation frequencies of 250/204 GHz

L Li, K Nomoto, M Pan, W Li, A Hickman… - IEEE Electron …, 2020 - ieeexplore.ieee.org
This work demonstrates the high-frequency and high-power performance capacity of GaN
high electron mobility transistors (HEMTs) on Si substrates. Using a T-gate and-GaN …

Scaling behavior of InAlN/GaN HEMTs on silicon for RF applications

P Cui, Y Zeng - Scientific Reports, 2022 - nature.com
Due to the low cost and the scaling capability of Si substrate, InAlN/GaN high-electron-
mobility transistors (HEMTs) on silicon substrate have attracted more and more attentions. In …

InAlN/GaN HEMT on Si with fmax= 270 GHz

P Cui, M Jia, H Chen, G Lin, J Zhang… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Device surface properties are critical for its performance such as channel electron density,
leakage current, subthreshold swing (SS), and noise in gallium nitride high-electron-mobility …

Analysis of low voltage RF power capability on AlGaN/GaN and InAlN/GaN HEMTs for terminal applications

Y Zhou, J Zhu, M Mi, M Zhang, P Wang… - IEEE Journal of the …, 2021 - ieeexplore.ieee.org
In this work, low voltage RF power capability on AlGaN/GaN and InAlN/GaN HEMTs is
analyzed from the perspective of DC and pulse characteristics, for terminal applications …

Deeply-scaled GaN-on-Si high electron mobility transistors with record cut-off frequency fT of 310 GHz

H Xie, Z Liu, Y Gao, K Ranjan, KE Lee… - Applied Physics …, 2019 - iopscience.iop.org
A deeply-scaled GaN-on-Si high electron mobility transistor with a record-high cut-off
frequency (f T) of 310áGHz has been demonstrated. The device has an InAlN/GaN …

CMOS-compatible GaN-on-Si HEMTs with cut-off frequency of 210 GHz and high Johnson's figure-of-merit of 8.8 THz V

H Xie, Z Liu, Y Gao, K Ranjan, KE Lee… - Applied Physics …, 2020 - iopscience.iop.org
GaN-on-Si high electron mobility transistors (HEMTs) with 80ánm gate length fabricated
using Si CMOS-compatible Ta/Al ohmic and Ti/Al gate contacts are reported in this work …

Recent progress on heteroepitaxial growth of single crystal diamond films

V Uwihoreye, Y Hu, G Cao, X Zhang, FE Oropeza… - Electron, 2024 - Wiley Online Library
Diamond is an ultimate semiconductor with exceptional physical and chemical properties,
such as an ultra‐wide bandgap, excellent carrier mobility, extreme thermal conductivity, and …

LG 55 nm T‐gate InGaN/GaN channel based high electron mobility transistors for stable transconductance operation

R Angamuthu… - … Journal of RF and …, 2022 - Wiley Online Library
Nonlinearity operation and early gain suppression limit the high‐frequency operation of GaN‐
HEMTs. Nonlinear transconductance and resistance drop‐off at relatively large V GS are the …

High efficiency over 70% at 3.6-GHz InAlN/GaN HEMT fabricated by gate recess and oxidation process for low-voltage RF applications

Y Zhou, M Mi, Y Han, P Wang, Y Chen… - … on Electron Devices, 2022 - ieeexplore.ieee.org
In this work, high-efficiency InAlN/GaN high electron mobility transistor (HEMT) is fabricated
by recess and oxidation process under the gate (RAO) for low-voltage RF applications …