The growth mode of α-Fe2O3 thin films by DC magnetron sputtering
Abstract Hematite (α-Fe 2 O 3) thin films were successfully prepared on a clean silicon
substrate via the direct current (DC) magnetron sputtering. The composition and …
substrate via the direct current (DC) magnetron sputtering. The composition and …
Bare and nonionic surfactant-functionalized praseodymium oxide nanoparticles: Toxicological studies
The applications of praseodymium oxide (Pr 6 O 11) nanomaterials in catalysis, oxygen
storage materials, and optical devices are the emergent areas that possess an urgent …
storage materials, and optical devices are the emergent areas that possess an urgent …
Nanoindentation data analysis of loading curve performed on DLC thin films: Effect of residual stress on the elasto-plastic properties
M Ouchabane, C Dublanche-Tixier… - Journal of Applied …, 2017 - pubs.aip.org
The present work is a contribution to the understanding of the mechanical behavior of DLC
thin films through nanoindentation tests. DLC films of different thicknesses deposited by the …
thin films through nanoindentation tests. DLC films of different thicknesses deposited by the …
Effect of silicon content on microstructure and mechanical properties of AlSi alloy coating obtained by physical vapour deposition
E Saoudi, R Younes, N Mesrati… - Transactions of the …, 2024 - Taylor & Francis
Several contents of silicon in AlSi coatings, and substrate nature, were investigated in this
present research. For this purpose, thin films were deposited by Physical Vapour Deposition …
present research. For this purpose, thin films were deposited by Physical Vapour Deposition …
Structure and mechanical properties of (AlCrNbSiTiV) N thin films deposited using reactive direct current magnetron sputtering
SF Wan, DL Zuo, RC Hsiao, JY Kao… - Science of Advanced …, 2018 - ingentaconnect.com
High quality (AlCrNbSiTiV) N high entropy alloy nitride thin films are prepared using reactive
direct current (dc) magnetron sputtering. The effect of substrate bias (from 0 to–200 V) on the …
direct current (dc) magnetron sputtering. The effect of substrate bias (from 0 to–200 V) on the …