Impact of high k spacer on RF stability performance of double gate junctionless transistor

V Raju, K Sivasankaran - International Journal of Numerical …, 2019 - Wiley Online Library
In this paper, radio frequency (RF) stability performance of double gate junctionless
transistor for different spacer material, the width of spacer, and bias conditions is reported …

A rigorous investigation of electrostatic and transport phenomena of GaN double-channel HEMT

IKMR Rahman, MI Khan… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
This paper presents a comprehensive investigation of electrostatics and transport
characterization of GaN double-channel (DC) MOS-HEMT. Upon derivation of a polynomial …

Impact of quantum confinement on transport and the electrostatic driven performance of silicon nanowire transistors at the scaling limit

T Al-Ameri, VP Georgiev, T Sadi, Y Wang… - Solid-State …, 2017 - Elsevier
In this work we investigate the impact of quantum mechanical effects on the device
performance of n-type silicon nanowire transistors (NWT) for possible future CMOS …

Electrical Stability of MOS Structures With AlON and AlO Dielectrics Deposited on n-and p-Type GaN

W Gonçalez Filho, M Borga, K Geens… - … on Electron Devices, 2024 - ieeexplore.ieee.org
This article discusses the electrical stability of MOS structures on n-and p-type GaN for two
different dielectrics, AlON and Al2O3, deposited by atomic layer deposition (ALD). Threshold …

Fin-width effects on characteristics of InGaAs-based independent double-gate FinFETs

SJ Chang, H Zhou, N Gong, DM Kang… - IEEE Electron …, 2017 - ieeexplore.ieee.org
We report the characteristics of InGaAs-based independent double-gate FinFETs with Al 2 O
3/LaAlO 3 as gate dielectric. The device can be operated in three different modes (ie, single …

Analytical modeling of electrostatic characteristics of enhancement mode GaN double channel HEMT

IKMR Rahman, MI Khan, M Mahdia… - 2018 IEEE 13th …, 2018 - ieeexplore.ieee.org
In this paper, the electrostatic characteristics of enhancement mode GaN double channel
MOS-HEMT has been investigated. A polynomial analytical expression establishing a …

[HTML][HTML] Analytical drain current and performance evaluation for inversion type InGaAs gate-all-around MOSFET

IKM Rahman, MI Khan, QDM Khosru - AIP Advances, 2021 - pubs.aip.org
This paper presents an analytical investigation of the drain current model for symmetric short
channel InGaAs gate-all-around (GAA) MOSFETs valid from depletion to strong inversion …

Comparative study of quantum mechanical Capacitance Voltage characteristics and threshold voltage of two different structures of Junction Less Nanowire Transistor

N Tasneem, MMR Adnan, MSB Hafiz… - 2016 IEEE Region 10 …, 2016 - ieeexplore.ieee.org
This work presents the evaluation, as well as comparison of Capacitance-Voltage (CV)
characteristic and threshold voltage variation of two different structures of Junction Less …

III–V tri-gate quantum well MOSFET: Quantum ballistic simulation study for 10 nm technology and beyond

K Datta, QDM Khosru - Solid-State Electronics, 2016 - Elsevier
In this work, quantum ballistic simulation study of a III–V tri-gate MOSFET has been
presented. At the same time, effects of device parameter variation on ballistic, subthreshold …

Electrostatic characterization and threshold voltage modeling of inversion type InGaAs gate-all-around MOSFET

IKMR Rahman, MI Khan, QDM Khosru - Journal of Computational …, 2021 - Springer
This paper presents an analytical investigation of the electrostatic properties of a moderately
doped symmetric gate-all-around nanowire MOSFET having InGaAs channel. The model is …