Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

This paper reviews several high‐k ALD processes potentially applicable to the production of
capacitors, concentrating on very recent developments. A list of the dielectric materials …

Nanostructured materials such as nanocomposites and nanolaminates are currently of
intense interest in modern materials research. Nanolaminate materials are fully dense, ultra …

Multilayer nanolaminates (NLs) of alternate ultrathin sublayers of Al2O3 and TiO2 (ATA) with
the thickness ranging∼ 2 to 0.5 nm were fabricated by optimized pulsed laser deposition …

Carrier-selective contacts based on thin oxides of nickel and titanium are computationally
investigated for heterojunction silicon solar cells. Replacing the standard amorphous/c-Si …

Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic
process enable the growth of conformal thin films with precise thickness control and sharp …

Maxwell–Wagner relaxation dominated Al 2 O 3/TiO 2 nanolaminates (ATA NLs) have
recently demonstrated their potential for high-density energy storage applications. In this …

Abstract TiO 2/Al 2 O 3 nanolaminates are being investigated to obtain unique materials with
chemical, physical, optical, electrical and mechanical properties for a broad range of …

Dielectric loss is a crucial factor in determining the long‐term endurance for security and
energy loss of dielectric composites. Here, chain‐like semiconductive fibers of titanium …