Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
W Liu, F Wan, TB Stachowiak - US Patent 10,509,313, 2019 - Google Patents
A nanoimprint lithography method includes disposing a pretreatment composition including
a polymerizable com ponent on a substrate to form a pretreatment coating. Dis crete imprint …
a polymerizable com ponent on a substrate to form a pretreatment coating. Dis crete imprint …
Substrate pretreatment and etch uniformity in nanoimprint lithography
T Stachowiak, W Liu, F Wan, G Doyle… - US Patent …, 2019 - Google Patents
A nanoimprint lithography method includes contacting a composite polymerizable coating
formed from a pretreatment composition and an imprint resist with a nanoimprint lithography …
formed from a pretreatment composition and an imprint resist with a nanoimprint lithography …
Curing substrate pretreatment compositions in nanoimprint lithography
TB Stachowiak, W Liu - US Patent 10,620,539, 2020 - Google Patents
(57) ABSTRACT A nanoimprint lithography method includes disposing a pretreatment
composition on a nanoimprint lithography sub strate to form a pretreatment coating, and …
composition on a nanoimprint lithography sub strate to form a pretreatment coating, and …
Removing substrate pretreatment compositions in nanoimprint lithography
TB Stachowiak, W Liu, N Khusnatdinov, Z Ye… - US Patent …, 2018 - Google Patents
A nanoimprint lithography method to remove uncured pretreatment composition from an
imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment …
imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment …
Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
W Liu, TB Stachowiak, JP DeYoung… - US Patent …, 2018 - Google Patents
Facilitating throughput in nanoimprint lithography processes by using an imprint resist
including fluorinated components and a substrate treated with a pretreatment composition to …
including fluorinated components and a substrate treated with a pretreatment composition to …
Substrate pretreatment for reducing fill time in nanoimprint lithography
N Khusnatdinov, TB Stachowiak, W Liu - US Patent 10,668,677, 2020 - Google Patents
A nanoimprint lithography method includes disposing a pretreatment composition on a
substrate to form a pretreatment coating. The pretreatment composition includes a …
substrate to form a pretreatment coating. The pretreatment composition includes a …
Substrate pretreatment compositions for nanoimprint lithography
TB Stachowiak, W Liu, F Wan - US Patent 10,317,793, 2019 - Google Patents
A nanoimprint lithography method includes coating a surface of a nanoimprint lithography
substrate with a pretreatment composition to yield a layer of the pretreatment composition on …
substrate with a pretreatment composition to yield a layer of the pretreatment composition on …