The aim of this study is to gain a deeper understanding of the micromorphology
characteristics of thin titanium nitride (TiN) films sputtered on glass substrates by using ion …

Magnetron sputtering is a plasma-based Physical Vapor Deposition technique for synthesis
of surface coatings. In the present survey, we have summarized and discussed in detail both …

Surface roughness seriously affects the electromagnetic performance of capacitive radio
frequency (RF) micro-electromechanical system (MEMS) switches. This review presents the …

We present a comparative study of the optical properties of 50 nm-thick titanium nitride (TiN)
films deposited on a silicon substrate by pulsed-DC sputtering, thermal, and plasma …

The hardness and toughness of HfN films alloying with Ta element is crucial for their wear
resistance when they are applied in the harsh environment. In this study, Ta x Hf 1− x N (x= 0 …

Nanocrystalline MoO3 films were synthesized using thermal oxidation of molybdenum films
deposited on quartz substrates by DC magnetron sputtering at different sputtering powers …

TiN x thin films were deposited on glass substrates using direct current reactive magnetron
sputtering, and effects of sputtering pressure on optical reflectance and infrared emissivity of …

TiN x films were deposited using direct current reactive magnetron sputtering on glass
substrates, and the variation of resistivity and infrared emissivity of TiN x films deposited at …

TiN films were oxidized at different temperatures (300, 400, 500, and 600° C) for different
times (1, 10, 50, and100 h), and the effect of oxidation behavior on optical performance and …

We report structure properties of Cu thin films in nanoscale with different surface
morphology. Cu thin films with layer thicknesses of 25, 50 and 75 nm were prepared by DC …