Atomic layer deposition (ALD) has become an indispensable thin-film technology in the
contemporary microelectronics industry. The unique self-limited layer-by-layer growth …

Catalysts based on Cu nanocrystals (NCs) for electrochemical CO2‐to‐C2+ conversion with
high activity have been a subject of considerable interest, but poor stability and low …

The advancement of Internet of Things has stimulated huge demands on low-voltage flexible
electronics. Carbon-nanotube (CNT)-based electronics are of great promise to this end for …

Iron, cobalt, and nickel chalcogenides are a class of fascinating materials, which have many
applications in cutting-edge technologies. Atomic layer deposition (ALD) is a highly useful …

Vanadium dioxide (VO 2) is one of the most well-known thermochromic materials, which
exhibits a notable optical change from transparent to reflecting in the infrared region upon a …

Atomic scale engineering of materials and interfaces has become increasingly important in
material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many …

Atomic layer deposition (ALD) of metal sulfides has aroused tremendous interest recently for
its promising applications in many varieties of areas. However, most of the metal sulfide ALD …

Atomic layer deposition was adopted to deposit VO x thin films using vanadyl tri-
isopropoxide {VO [O (C3H7)] 3, VTIP} and water (H2O) at 135° C. The self-limiting and purge …

Interface passivation plays a pivotal role in achieving high-efficiency organic metal halide
perovskite solar cells (PSCs). It has been recently revealed that atomic layer deposition …

Atomic layer deposition (ALD) is a highly useful technique to grow thin film materials, and
the initial growth of ALD is of particular importance for achieving high-quality materials and …