Following the graphene isolation, strong interest in two dimensional (2D) materials has been
driven by their outstanding properties. Their typical intrinsic structure, including strong in …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

Since the discovery of graphene, there has been an ever-increasing interest in two-
dimensional (2D) layered materials with exceptional properties. To this end, a variety of …

The wafer-scale synthesis of MoS2 layers with precise thickness controllability and excellent
uniformity is essential for their application in the nanoelectronics industry. Here, we …

Although the gas-phase production of nanostructured solids has already been carried out in
industry for decades, only in recent years has research interest in this topic begun to …

Deposition providing precise control of the film thickness, low deposition temperature, and
noncorrosive byproducts is essential for the efficient fabrication of barrier layers in …

Atomic layer deposition (ALD) was used to coat γ-Al2O3 particles with oxide films of varying
Mg/Al atomic ratios, which resulted in systematic variation of the acid and base site areal …

Tungsten oxide–silicon dioxide (WO x–SiO y) composite thin films were deposited for the
first time via the remote oxygen plasma-enhanced atomic layer deposition (ALD) process …

Electrochemically active nanocrystalline tungsten oxide was synthesized in supercritical
carbon dioxide from tungsten hexacarbonyl at 150° C and 400 bar in the presence of …