This article discusses the transition of a form of nanoimprint lithography technology, known
as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication …

Recent innovations in the area of micro-and nanofabrication have created a unique
opportunity for patterning surfaces with features with lateral dimensions spanning over the …

Nanoimprint lithography (NIL) is a high throughput, high-resolution parallel patterning
method in which a surface pattern of a stamp is replicated into a material by mechanical …

This review provides a survey of lithography techniques and the resist materials employed
with these techniques. The first part focuses on the conventional lithography methods used …

Releasing the potential of advanced material properties by controlled structuring materials
on sub-100-nm length scales for applications such as integrated circuits, nano …

The term nanoimprint lithography (NIL) describes a number of processes used to form
nanoscale structures by molding or embossing. Step and flash imprint lithography (S-FIL, a …

Resist filling process in UV-nanoimprint lithography is investigated by numerical simulation.
A resist droplet on a substrate is pressed by a template and the resist flows laterally with …

The success of any nanoimprint process depends upon its ability to exactly reproduce the
template pattern. Thus, complete filling of recessed features in the template is an important …

The effectiveness of using a condensable gas in UV nanoimprint lithography has been
demonstrated. The problem of bubble defects, which is inherent in UV nanoimprinting under …

Roll-to-roll (R2R) ultraviolet (UV) imprinting technology, because of its merits of low cost,
high throughput, and large-area patterning, is attracting interest from academia and industry …