[HTML][HTML] Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films
Titanium dioxide (TiO 2) films with thicknesses around 300 nm were deposited on glass
substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering …
substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering …
Microstructure, optical, electrical properties, and leakage current transport mechanism of sol–gel-processed high-k HfO2 gate dielectrics
P Jin, G He, D Xiao, J Gao, M Liu, J Lv, Y Liu… - Ceramics …, 2016 - Elsevier
Deposition of high-k HfO 2 gate dielectric films on n-type Si and quartz substrates by sol–gel
spin-on coating technique has been performed and the structural, optical and electrical …
spin-on coating technique has been performed and the structural, optical and electrical …
Photoelectrochemical degradation of azo dye over pulsed laser deposited nitrogen-doped TiO2 thin film
We investigated the synergetic effect of electrochemical and photocatalytic oxidation in
photoelectrochemical (PEC) process for the degradation of hazardous organic compounds …
photoelectrochemical (PEC) process for the degradation of hazardous organic compounds …
Structural and optical properties of TiO2 thin films grown by sol-gel dip coating process
The mono and bi-layer TiO 2 thin films have been prepared by sol-gel method on glass. X-
Ray diffraction, Raman spectroscopy, atomic force microscopy, spectroscopic ellipsometry …
Ray diffraction, Raman spectroscopy, atomic force microscopy, spectroscopic ellipsometry …
Photocatalytic activity of pulsed laser deposited TiO2 thin films in N2, O2 and CH4
We report on pulsed laser deposition of TiO2 films on glass substrates in oxygen, methane,
nitrogen and mixture of oxygen and nitrogen atmosphere. The nitrogen incorporation into …
nitrogen and mixture of oxygen and nitrogen atmosphere. The nitrogen incorporation into …
Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide
N-doped TiO 2 thin films were prepared using pulsed laser deposition by ablating metallic Ti
target with pulses of 248 nm wavelength, at 330° C substrate temperature in reactive …
target with pulses of 248 nm wavelength, at 330° C substrate temperature in reactive …
Sputter deposition of high transparent TiO2− xNx/TiO2/ZnO layers on glass for development of photocatalytic self-cleaning application
In this study, TiO2− xNx/TiO2 double layers thin film was deposited on ZnO (80nm
thickness)/soda–lime glass substrate by a dc reactive magnetron sputtering. The TiO2 film …
thickness)/soda–lime glass substrate by a dc reactive magnetron sputtering. The TiO2 film …
Annealing-temperature-modulated optical, electrical properties, and leakage current transport mechanism of sol–gel-processed high-k HfAlOx gate dielectrics
P Jin, G He, ZB Fang, M Liu, DQ Xiao, J Gao… - Ceramics …, 2017 - Elsevier
Deposition of HfAlO x gate dielectric films on n-type Si and quartz substrates by sol-gel
technique has been performed and the optical, electrical characteristics of the as-deposited …
technique has been performed and the optical, electrical characteristics of the as-deposited …
Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering
ZG Li, S Miyake - Applied Surface Science, 2009 - Elsevier
N-doped TiO2 thin films have been deposited on unheated glass substrates by an
inductively coupled plasma (ICP) assisted direct current (dc) reactive magnetron sputtering …
inductively coupled plasma (ICP) assisted direct current (dc) reactive magnetron sputtering …
[HTML][HTML] Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
B Gao, S Zhang, X Ju, Y Lin, X Wang - AIP Advances, 2017 - pubs.aip.org
Nanostructured TiO 2 films were grown on a monocrystalline silicon substrate by a
femtosecond pulsed laser ablating a Ti target in atmosphere without a vacuum chamber …
femtosecond pulsed laser ablating a Ti target in atmosphere without a vacuum chamber …