From wearable sensors to smart implants-–toward pervasive and personalized healthcare

J Andreu-Perez, DR Leff, HMD Ip… - IEEE Transactions on …, 2015 - ieeexplore.ieee.org
Objective: This paper discusses the evolution of pervasive healthcare from its inception for
activity recognition using wearable sensors to the future of sensing implant deployment and …

Leakage characterization of 10T SRAM cell

A Islam, M Hasan - IEEE transactions on electron devices, 2012 - ieeexplore.ieee.org
This paper presents a technique for designing a low-power and variability-aware SRAM cell.
The cell achieves low power dissipation due to its series-connected tail transistor and read …

High immunity to threshold voltage variability in undoped ultra-thin FDSOI MOSFETs and its physical understanding

O Weber, O Faynot, F Andrieu… - 2008 IEEE …, 2008 - ieeexplore.ieee.org
Sources responsible for local and inter-die threshold voltage (V t) variability in undoped ultra-
thin FDSOI MOSFETs with a high-k/metal gate stack are experimentally discriminated for the …

Effective teaching of the physical design of integrated circuits using educational tools

SM Aziz, E Sicard, SB Dhia - IEEE Transactions on Education, 2009 - ieeexplore.ieee.org
This paper presents the strategies used for effective teaching and skill development in
integrated circuit (IC) design using project-based learning (PBL) methodologies. It presents …

Multi-scale Monte Carlo simulation of soft errors using PHITS-HyENEXSS code system

S Abe, Y Watanabe, N Shibano, N Sano… - … on Nuclear Science, 2012 - ieeexplore.ieee.org
We have proposed a multi-scale Monte Carlo simulation method of neutron induced soft
errors by linking a particle transport code PHITS and a 3-D TCAD simulator HyENEXSS. An …

Accurate simulation of transistor-level variability for the purposes of TCAD-based device-technology cooptimization

L Gerrer, AR Brown, C Millar, R Hussin… - … on Electron Devices, 2015 - ieeexplore.ieee.org
In this paper we illustrate how the predictive Technology Computer Aided Design (TCAD)
process device simulation can be used to evaluate process, statistical, and time-dependent …

Analysis of charge deposition and collection caused by low energy neutrons in a 25-nm bulk CMOS technology

S Abe, Y Watanabe - IEEE Transactions on Nuclear Science, 2014 - ieeexplore.ieee.org
Neutron-induced single event upsets (SEUs) in a 25-nm NMOSFET are analyzed using
PHYSERD simulation. We confirm that the secondary H and He ions dominate SEUs above …

Neutron-induced soft error analysis in MOSFETs from a 65nm to a 25 nm design rule using multi-scale Monte Carlo simulation method

S Abe, Y Watanabe, N Shibano, N Sano… - 2012 IEEE …, 2012 - ieeexplore.ieee.org
We have analyzed terrestrial neutron-induced soft errors in MOSFETs from a 65 nm to a 25
nm design rule by means of multi-scale Monte Carlo simulation using PHITS-HyENEXSS …

Variability analysis of stochastic parameters on the electrical performance of on-chip current-mode interconnect system

Y Agrawal, R Chandel, R Dhiman - IETE Journal of Research, 2017 - Taylor & Francis
Current-mode signalling scheme is one of the prominent solutions for high-speed and high
data rate communication in global on-chip interconnects. Advancements in nanofabrication …

Impact of nuclear reaction models on neutron-induced soft error rate analysis

S Abe, R Ogata, Y Watanabe - IEEE Transactions on Nuclear …, 2014 - ieeexplore.ieee.org
Terrestrial neutron-induced soft error rate (SER) analyses in the 25-nm design rule MOSFET
are performed by means of multiscale Monte Carlo simulation with different nuclear reaction …