We report the surface reaction mechanism of the atomic layer deposition (ALD) of niobium
oxide films by combining experimental and theoretical studies. Tert-butylimido tris …

Thin films of niobium nitride are useful for their physical, chemical, and electrical properties.
NbN superconducting properties have been utilized in a wide range of applications. Plasma …

Transition metal nitride thin films such as TiN are necessary as conducting electrodes in
memory and transistor devices. Due to their high work function (> 4.7 eV), NbN thin films …

The efficiency of the superconducting radio frequency cavities composed of Nb required the
deposition of thickness-controlled multilayer coatings of superconductor-insulator …

This paper describes the deposition of superconductive Nb-N thin films in a metal-organic
plasma-enhanced atomic layer deposition process using (tert-butylimido)-tris (diethylamino) …

Niobium nitride thin films have been usually deposited by reactive magnetron sputtering.
Atomic layer deposition (ALD) has emerged as viable candidate for growth of ultrathin films …