Grid-based contact center

RC Steiner - US Patent 8,964,958, 2015 - Google Patents
(57) ABSTRACT A grid-based contact center and method of managing tasks within such a
contact center is provided. Nodes within the contact center are adapted to perform multiple …

Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method …

DB Millward, TA Quick, JN Greeley - US Patent 8,097,175, 2012 - Google Patents
Methods of forming metal oxide structures and methods of forming metal oxide patterns on a
substrate using a block copolymer system formulated for self-assembly. The metal oxide …

Method to produce nanometer-sized features with directed assembly of block copolymers

DB Millward, GS Sandhu - US Patent 8,999,492, 2015 - Google Patents
US8999492B2 - Method to produce nanometer-sized features with directed assembly of block
copolymers - Google Patents US8999492B2 - Method to produce nanometer-sized features with …

Multilayer antireflection coatings, structures and devices including the same and methods of making the same

EP Marsh, DB Millward - US Patent 8,294,139, 2012 - Google Patents
Multi-layer antireflection coatings, devices including multi-layer antireflection coatings and
methods of forming the same are disclosed. A block copolymer is applied to a substrate and …

Methods of patterning a substrate

DB Millward - US Patent 7,959,975, 2011 - Google Patents
A method of patterning a substrate is disclosed. An ink material is chemisorbed to at least
one region of a stamp and the chemisorbed ink material is transferred to a receptor …

Preparation of 2, 2′-di (3, 4-ethylenedioxythiophene) s

K Reuter - US Patent 7,102,016, 2006 - Google Patents
US7102016B2 - Preparation of 2,2′-di(3,4-ethylenedioxythiophene)s - Google Patents
US7102016B2 - Preparation of 2,2′-di(3,4-ethylenedioxythiophene)s - Google Patents …

Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers

DB Millward - US Patent 8,557,128, 2013 - Google Patents
US8557128B2 - Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic
monolayers - Google Patents US8557128B2 - Sub-10 nm line features via rapid graphoepitaxial …

Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces

DB Millward, D Westmoreland, G Sandhu - US Patent 8,609,221, 2013 - Google Patents
5,925,259 A 7/1999 Biebuycket al. 7,115,995 B2 10/2006 Wong 5.948, 470 A 9, 1999
Harrison et al. 7,118,784 B1 10/2006 Xie 5,958,704 A 9, 1999 Starzl et al. 7,119,321 B2 …

Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference

DB Millward, T Quick - US Patent 8,633,112, 2014 - Google Patents
5,948,470 A 9/1999 Harrison et a1. 7,115,995 B2 10/2006 Wong 5,958,704 A 9/1999
Starzletal. 7,118,784 B1 10/2006 X19 6051869 A 4/2000 Pan etal ' 7,119,321 B2 10/2006 …

Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers

DB Millward - US Patent 8,801,894, 2014 - Google Patents
5,891.356 A 4/1999 Inoue et al. 7,090,784 B2 8/2006 Asakawa et al. 5,904.824 A 5, 1999
Oh 7,112,617 B2 9, 2006 Kim et al. 5,925,259 A 7/1999 Biebuycket al. 7,115,305 B2 …