Enhanced Raman scattering with dielectrics

I Alessandri, JR Lombardi - Chemical reviews, 2016 - ACS Publications
Dielectrics represent a new frontier for surface-enhanced Raman scattering. They can serve
as either a complement or an alternative to conventional, metal-based SERS, offering key …

High‐aspect‐ratio nanostructured surfaces as biological metamaterials

SG Higgins, M Becce… - Advanced …, 2020 - Wiley Online Library
Materials patterned with high‐aspect‐ratio nanostructures have features on similar length
scales to cellular components. These surfaces are an extreme topography on the cellular …

Black silicon solar cells with interdigitated back-contacts achieve 22.1% efficiency

H Savin, P Repo, G Von Gastrow, P Ortega… - Nature …, 2015 - nature.com
The nanostructuring of silicon surfaces—known as black silicon—is a promising approach to
eliminate front-surface reflection in photovoltaic devices without the need for a conventional …

Black silicon: fabrication methods, properties and solar energy applications

X Liu, PR Coxon, M Peters, B Hoex, JM Cole… - Energy & …, 2014 - pubs.rsc.org
Black silicon (BSi) represents a very active research area in renewable energy materials.
The rise of BSi as a focus of study for its fundamental properties and potentially lucrative …

[图书][B] Integrated optics

RG Hunsperger - 1995 - Springer
The transmission and processing of signals carried by optical beams rather than by
electrical currents or radio waves has been a topic of great interest ever since the early …

Silicon micromachined hollow microneedles for transdermal liquid transport

HJGE Gardeniers, R Luttge… - Journal of …, 2003 - ieeexplore.ieee.org
This paper presents a novel process for the fabrication of out-of-plane hollow microneedles
in silicon. The fabrication method consists of a sequence of deep-reactive ion etching …

Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE …

HV Jansen, MJ De Boer, S Unnikrishnan… - Journal of …, 2009 - iopscience.iop.org
An intensive study has been performed to understand and tune deep reactive ion etch
(DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and …

Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro-and nanostructures

F Marty, L Rousseau, B Saadany, B Mercier… - Microelectronics …, 2005 - Elsevier
Different processes involving an inductively coupled plasma reactor are presented either for
deep reactive ion etching or for isotropic etching of silicon. On one hand, high aspect ratio …

Surface tension-powered self-assembly of microstructures-the state-of-the-art

RRA Syms, EM Yeatman, VM Bright… - Journal of …, 2003 - ieeexplore.ieee.org
Because of the low dimensional power of its force scaling law, surface tension is appropriate
for carrying out reshaping and assembly in the microstructure size domain. This paper …

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

R Dussart, T Tillocher, P Lefaucheux… - Journal of Physics D …, 2014 - iopscience.iop.org
The evolution of silicon cryoetching is reported in this topical review, from its very first
introduction by a Japanese team to today's advanced technologies. The main advances in …