Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach
This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …
block co-and terpolymers and their application towards the fabrication of high-resolution …
Directed Self‐Assembly of Liquid‐Crystalline Molecular Building Blocks for Sub‐5 nm Nanopatterning
K Nickmans, APHJ Schenning - Advanced Materials, 2018 - Wiley Online Library
The thin‐film directed self‐assembly of molecular building blocks into oriented nanostructure
arrays enables next‐generation lithography at the sub‐5 nm scale. Currently, the fabrication …
arrays enables next‐generation lithography at the sub‐5 nm scale. Currently, the fabrication …
Block copolymer‐based supramolecular ionogels for accurate on‐skin motion monitoring
Interest in wearable and stretchable on‐skin motion sensors has grown rapidly in recent
years. To expand their applicability, the sensing element must accurately detect external …
years. To expand their applicability, the sensing element must accurately detect external …
Fabrication of sub-3 nm feature size based on block copolymer self-assembly for next-generation nanolithography
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be
much reduced (say less than 10 nm). Though some research groups reported feature size of …
much reduced (say less than 10 nm). Though some research groups reported feature size of …
Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning
We report herein the modular synthesis and nanolithographic potential of poly
(dimethylsiloxane-block-methyl methacrylate)(PDMS-b-PMMA) with self-assembled …
(dimethylsiloxane-block-methyl methacrylate)(PDMS-b-PMMA) with self-assembled …
Self-assembly of an ultrahigh-χ block copolymer with versatile etch selectivity
We report the successful synthesis of previously inaccessible poly (3-hydroxystyrene)-block-
poly (dimethylsiloxane)(P3HS-b-PDMS) block copolymers (BCPs) with varying volume …
poly (dimethylsiloxane)(P3HS-b-PDMS) block copolymers (BCPs) with varying volume …
Gallol-based block copolymer with a high flory–huggins interaction parameter for next-generation lithography
The self-assembly of block copolymers has potential applications for next-generation
lithography with a small feature size of less than 10 nm. Though a feature size of∼ 5 nm has …
lithography with a small feature size of less than 10 nm. Though a feature size of∼ 5 nm has …
Synthesis of a fluoromethacrylate hydroxystyrene block copolymer capable of rapidly forming sub-5 nm domains at low temperatures
C Wang, X Li, H Deng - ACS Macro Letters, 2019 - ACS Publications
A series of poly (pentadecafluorooctyl methacrylate)-block-polyhydroxystyrene (PPDFMA-b-
PHS) block copolymers (BCPs) were synthesized via reversible addition–fragmentation …
PHS) block copolymers (BCPs) were synthesized via reversible addition–fragmentation …
Sub-3-Nanometer Domain Spacings of Ultrahigh-χ Multiblock Copolymers with Pendant Ionic Groups
We investigated the temperature-dependent phase behavior and interaction parameter of
polyethylene-based multiblock copolymers with pendant ionic groups. These step-growth …
polyethylene-based multiblock copolymers with pendant ionic groups. These step-growth …
Lithium salt-induced microstructure and ordering in diblock copolymer/homopolymer blends
This work details the phase behavior of a pseudoternary polymer blend system containing
poly (ethylene oxide)(PEO) and polystyrene (PS) homopolymers, a PS–PEO block …
poly (ethylene oxide)(PEO) and polystyrene (PS) homopolymers, a PS–PEO block …