Spin-on carbon compositions for lithographic processing

V Krishnamurthy, DM Sullivan, Y Wang, Q Lin… - US Patent …, 2014 - Google Patents
The invention described herein is directed towards spin-on carbon materials comprising
polyamic acid compositions and a crosslinker in a solvent system. The materials are useful …

Methods of coating wellbore tools and components having such coatings

S Kumar, H John - US Patent 9,121,237, 2015 - Google Patents
(57) ABSTRACT A method for forming a coating upon a wellbore tool includes
formingapattern of features supported by a body and forming a coating over the pattern of …

Dendritic polyurethane coating

TF Choate - US Patent 8,568,888, 2013 - Google Patents
US8568888B2 - Dendritic polyurethane coating - Google Patents US8568888B2 - Dendritic
polyurethane coating - Google Patents Dendritic polyurethane coating Download PDF Info …

Spin-on carbon compositions for lithographic processing

V Krishnamurthy, DM Sullivan, Y Wang, Q Lin… - US Patent …, 2015 - Google Patents
The invention described herein is directed towards spin-on carbon materials comprising
polyamic acid compositions and a crosslinker in a solvent system. The materials are useful …

Protective film-forming composition

Y Hashimoto, H Tokunaga, H Ogata, T Ohashi… - US Patent …, 2021 - Google Patents
A composition for forming protective films against aqueous hydrogen peroxide solutions,
including: a compound of the following formula (1a) or formula (1b) or a compound having a …

Dendritic polyurethane coating

TF Choate - US Patent 8,206,827, 2012 - Google Patents
US8206827B2 - Dendritic polyurethane coating - Google Patents US8206827B2 - Dendritic
polyurethane coating - Google Patents Dendritic polyurethane coating Download PDF Info …

Composition for forming resist underlayer

S Nakasugi, M Suzuki, J Li, M Misumi… - US Patent …, 2016 - Google Patents
BACKGROUND In manufacturing semiconductor devices, microfabrica tion is generally
carried out according to lithography tech niques by use of photoresist. The process of …

High-silicon-content wet-removable planarizing layer

M Luo, Y Wang, K Sakavuyi… - US Patent 11,817,317, 2023 - Google Patents
Lithographic compositions for use as wet-removable silicon gap fill layers are provided. The
method of using these compositions involves utilizing a silicon gap fill layer over topographic …

Spin-on carbon compositions for lithographic processing

V Krishnamurthy, DM Sullivan, Y Wang… - US Patent App. 15 …, 2018 - Google Patents
The invention described herein is directed towards spin-on carbon materials comprising
polyamic acid compositions and a crosslinker in a solvent system. The materials are useful …

High solids content dendrimer polymer composition

W Shaofeng, SH Seow, Z Dou, TF Choate… - US Patent …, 2019 - Google Patents
The present invention relates to a polymer composition comprising:(i) one or more dendritic
polymers; and (ii) a reactive diluent that is capable of being chemically coupled to the …