Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …
(EUVL) has been the identification and optimization of suitable sources. These sources must …
Review of the 1st EUV Light Sources Code Comparison Workshop
We review the results of the 1 st Extreme Ultraviolet (EUV) Light Sources Code Comparison
Workshop. The goal of this workshop was to provide a platform for specialists in EUV light …
Workshop. The goal of this workshop was to provide a platform for specialists in EUV light …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
Tungsten spectra recorded at the LHD and comparison with calculations
CS Harte, C Suzuki, T Kato, HA Sakaue… - Journal of Physics B …, 2010 - iopscience.iop.org
We have measured extreme ultraviolet (EUV) spectra from highly charged tungsten ions in
low-density and high-temperature plasmas produced in the Large Helical Device at the …
low-density and high-temperature plasmas produced in the Large Helical Device at the …
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
EUV spectroscopy of highly charged ions in an electron-beam ion trap
Extreme-ultraviolet (EUV) spectra of Sn 13+− Sn 15+ ions have been measured in an
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …
Characterization of 1- and -wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet
(EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin …
(EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin …
Analysis of the fine structure of ions by optical spectroscopy in an electron-beam ion trap
We experimentally re-evaluate the fine structure of Sn 11+–Sn 14+ ions. These ions are
essential in bright extreme-ultraviolet (EUV) plasma-light sources for next-generation …
essential in bright extreme-ultraviolet (EUV) plasma-light sources for next-generation …