Studies of multiphoton production of vacuum-ultraviolet radiation in the rare gases

A McPherson, G Gibson, H Jara, U Johann, TS Luk… - JOSA B, 1987 - opg.optica.org
Measurements of the vacuum-ultraviolet (< 80-nm) radiation produced by intense ultraviolet
(248-nm) irradiation (10^ 15–10^ 16 W/cm^ 2) of rare gases have revealed the copious …

[图书][B] Microlithography: science and technology

BW Smith, K Suzuki - 2018 - taylorfrancis.com
This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma

K Bergmann, G Schriever, O Rosier, M Müller, W Neff… - Applied …, 1999 - opg.optica.org
An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a
small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a …

Investigation of soft X-ray emission from a gas puff target irradiated with a Nd: YAG laser

H Fiedorowicz, A Bartnik, M Szczurek, H Daido… - Optics …, 1999 - Elsevier
Experiments investigating soft X-ray emission in the 1–22 nm wavelength range from
plasmas produced using a gas puff target irradiated with a Nd: YAG laser are described. Gas …

Statistics and characteristics of xuv transition arrays from laser-produced plasmas of the elements tin through iodine

W Svendsen, G O'Sullivan - Physical Review A, 1994 - APS
Spectra of laser-produced plasmas of the elements from tin to iodine contain weak bands of
quasicontinuum overlaid by weak emission lines in the 70–120-Å region. Multiconfiguration …

Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd: YAG laser

H Fiedorowicz, A Bartnik, H Daido, IW Choi… - Optics …, 2000 - Elsevier
Extreme ultraviolet (EUV) emission in the 8–18 nm wavelength range from a new double-
stream gas puff target irradiated with a Nd: YAG laser has been studied for the first time. The …

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

MA Klosner, WT Silfvast - optics letters, 1998 - opg.optica.org
We have observed intense extreme-ultraviolet emission, within the 10–16-nm-wavelength
range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered …

Multiphoton-induced X-ray emission and amplification from clusters

A McPherson, TS Luk, BD Thompson, K Boyer… - Applied Physics B, 1993 - Springer
The development of a unified picture of short-pulse high-intensity multiphoton processes,
embracing atoms, molecules, and solids, appears possible through the study of clusters. Of …

Compact laser plasma EUV source based on a gas puff target for metrology applications

H Fiedorowicz, A Bartnik, R Jarocki, J Kostecki… - Journal of Alloys and …, 2005 - Elsevier
A newly developed compact laser plasma EUV source for metrology applications is
presented in the paper. The source is based on the double-stream gas puff target formed by …

Collision-free multiple photon ionization of atoms and molecules at 193 nm

TS Luk, U Johann, H Egger, H Pummer, CK Rhodes - Physical Review A, 1985 - APS
The nonlinear coupling of 193-nm radiation to a range of atomic and molecular materials
has been experimentally explored up to a maximum intensity on the order of∼ 10 17 W/cm …