Reactive plasmas are highly valued for their ability to produce large amounts of reactive
radicals and of energetic ions bombarding surrounding surfaces. The non-equilibrium …

Capacitive radio frequency (RF) discharge plasmas have been serving hi-tech industry (eg
chip and solar cell manufacturing, realization of biocompatible surfaces) for several years …

The effect of a magnetic field on the characteristics of capacitively coupled radio frequency
discharges is investigated and found to be substantial. A one-dimensional particle-in-cell …

A simple analytical model for the planar radio-frequency (rf) sheath in capacitive discharges
is developed that is based on the assumptions of a step profile for the electron front, charge …

The formation of sheaths near metallic or dielectric-coated wall materials in contact with a
plasma is ubiquitous, often giving rise to physical phenomena (sputtering, secondary …

Energy distribution and the flux of the ions coming on a surface are considered as the key-
parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …

Reactive magnetron sputtering is a widely used technique to deposit various materials such
as oxides and nitrides with a superior control of morphology and stoichiometry. The …

Al 2 O 3 thin films have been deposited at substrate temperatures between 500 C and 600 C
by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the …

Capacitively coupled plasma is investigated kinetically utilizing the particle-in-cell technique.
The argon (Ar) plasma is generated via two radio frequencies. The plasma bulk density …

Bounded plasmas are characterized by a rapid but smooth transition from quasi-neutrality in
the volume to electron depletion close to the electrodes and chamber walls. The thin non …