Multiple patterning layout decomposition (MPLD) has been widely investigated, but so far
there is no decomposer that dominates others in terms of both result quality and efficiency …

We present a new mathematical model for tiling finite subsets of $\mathbb {Z}^ 2$ using an
arbitrary, but finite, collection of polyominoes. Unlike previous approaches that employ …

As the feature size of the semiconductor technology scales down to 10 nm and beyond,
multiple patterning lithography (MPL) has become one of the most practical candidates for …

As the feature size of semiconductor technology shrinks to 7 nm and beyond, the multiple
patterning lithography (MPL) attracts more attention from the industry. In this paper, we …

Directed self-assembly technology with multiple patterning lithography (DSA-MP) is a
promising candidate for the next-generation lithography (NGL) technique for contact/via …

Multiple patterning lithography (MPL) is regarded as one of the most promising ways of
overcoming the resolution limitations of conventional optical lithography due to the delay of …

Multiple patterning lithography decomposition (MPLD) and mask optimization enable the
ever-shrinking device feature sizes far below the lithography system limit. Conventional …

Multiple patterning lithography (MPL) has been introduced in the integrated circuits
manufacturing industry to enhance feature density as the technology node advances. A …

As the feature size of semiconductor technology shrinks to 10 nm and beyond, the multiple
patterning lithography (MPL) attracts more attention from the industry. In this paper, we …

In the sub-7 nm technology nodes, the cost of printing dense via layers increases
dramatically. Directed self-assembly (DSA)(DSA) technology with multiple patterning (MP) …