Revival of ferroelectric memories based on emerging fluorite‐structured ferroelectrics

JY Park, DH Choe, DH Lee, GT Yu, K Yang… - Advanced …, 2023 - Wiley Online Library
Over the last few decades, the research on ferroelectric memories has been limited due to
their dimensional scalability and incompatibility with complementary metal‐oxide …

A review on morphotropic phase boundary in fluorite-structure hafnia towards DRAM technology

M Jung, V Gaddam, S Jeon - Nano Convergence, 2022 - Springer
In the present hyper-scaling era, memory technology is advancing owing to the demand for
high-performance computing and storage devices. As a result, continuous work on …

[HTML][HTML] Ferroelectrics Based on HfO2 Film

CM Song, HJ Kwon - Electronics, 2021 - mdpi.com
The discovery of ferroelectricity in HfO2 thin film, which is compatible with the CMOS
process, has revived interest in ferroelectric memory devices. HfO2 has been found to …

Back-End-of-Line Compatible HfO2/ZrO2 Superlattice Ferroelectric Capacitor With High Endurance and Remnant Polarization

B Cui, X Wang, Y Li, M Wu, Y Wu, J Liu… - IEEE Electron …, 2023 - ieeexplore.ieee.org
The hafnium-zirconium oxide (HZO) has been reported to be a promising candidate for low-
power VLSI logic and memory applications. However, the demand for high processing …

Improved Ferroelectricity and Tunneling Electro Resistance in Zr-Rich HfxZr1-xO2 Ferroelectric Tunnel Junction

J Yu, T Wang, Z Li, Y Liu, J Meng, K Xu… - IEEE Electron …, 2022 - ieeexplore.ieee.org
HfO2 based ferroelectric materials have great application potential in ferroelectric tunneling
junction. Here, the low temperature annealed Zr-Rich HfxZr films based ferroelectric tunnel …

Thickness dependence of the crystallization and phase transition in ZrO2 thin films.

Y Guan, J Zhou, H Zhong, W Wang… - Journal of …, 2023 - search.ebscohost.com
Fluorite-structure binary oxides (eg, HfO< sub> 2 and ZrO< sub> 2) have attracted
increasing interest for a broad range of applications including thermal barrier coatings, high …

Effective control of oxygen defects by co-doping of ferroelectric HfO2

Y Tian, Y Zhou, M Zhao, Y Ouyang, X Tao - Applied Physics Letters, 2023 - pubs.aip.org
In this work, the effect of VB metal doping HfO 2 is studied by first-principles calculation. The
doping of VB group elements has special oxygen defect behavior due to its pentavalent …

Low Thermal Budget Fabrication and Performance Comparison of MFM Capacitors With Thermal and Plasma-Enhanced Atomic Layer Deposited Hf0.45Zr0.55Ox …

DQ Xiao, BB Luo, W Xiong, X Wu… - … on Electron Devices, 2021 - ieeexplore.ieee.org
The ferroelectricity of Zr-doped HfO 2 (HZO) thin films induced by low thermal budget
annealing provides great potential to implement the ferroelectric functionalities into the back …

Non-centrosymmetric crystallization in ferroelectric hafnium zirconium oxide via photon-assisted defect modulation

S Lee, JG Choi, SH Kim, WJ Lee, T Kim… - Materials Science and …, 2024 - Elsevier
Abstract Ferroelectricity in Hf 1-x Zr x O 2 (HZO) thin films has garnered significant attention
for advanced memory devices. However, the challenge in understanding nanoscale …

Growth of the orthorhombic phase and inhibition of charge injection in ferroelectric HfO2-based MFIS memory devices with a high-permittivity dielectric seed layer

Y Zhang, D Wang, J Wang, C Luo, M Li, Y Li… - Science China …, 2023 - Springer
The poor endurance of the ferroelectric (FE) HfO2 (Fe-HfO2) material-based FE field-effect
transistor (Fe-FET) remains a major challenge for its future commercial production. Here we …