It is now well established that exposing inorganic and organic polymeric substrates to cold-
plasma species represents an unusually convenient and versatile surface-modification and …

Power-modulated (pulsed) plasmas have demonstrated several advantages compared to
continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …

The dispersion relation for helicon waves in a uniform, bounded plasma is derived with both
collisional and Landau damping. It is shown that the latter can explain the very high …

Helicon waves are right-hand polarized (RHP) waves which propagate in radially confined
magnetized plasmas for frequencies/spl omega//sub ci//spl Lt//spl omega//spl Lt//spl …

Plasma etching processes at the 22 nm technology node and below will have to satisfy
multiple stringent scaling requirements of microelectronics fabrication. To satisfy these …

A plasma reactor for forming a dense plasma from a gas is described incorporating a
housing, a gas inlet to the housing, a pump for evacuating the housing, a magnetic coil to …

In plasmas, a variety of radicals which are defined as electrically neutral radicals in this
article are efficiently produced by collisions between electrons and gas molecules. These …

A particle-in-cell simulation is used to model the plasma generated in a parallel plate RF
reactor at low pressure. Nonperiodic boundary conditions are used, and the electric field …

Helicon high-density (up to~ 1013 cm− 3) plasma sources using a radio frequency wave in
the presence of a magnetic field under a low pressure are very promising for various …

This book describes the equipment used in manufacturing for deposition and etching, such
as electrochemical deposition equipment used for plating copper. It emphasizes the …