In recent days, many studies have focused on fluorine-saturated yttrium-based coatings for
better material performance in semiconductor processing chambers. In this investigation …

In this work, we demonstrate the lateral metal–oxidesemiconductor field-effect transistors
(MOSFETs) with β-Ga 2 O 3 film (thickness= 150 nm) grown on a c-plane sapphire substrate …

Highly selective and vertical profile etching of thermally grown SiO 2 films using thin metallic
Ru mask films was investigated in a commercial inductively coupled plasma etcher. The …

This study investigates the microstructure, mechanical and electrical properties of dense
yttrium oxyfluoride (YOF) coatings fabricated by the atmospheric plasma spraying technique …

Effective Ohmic contact between metals and their conductive channels is a crucial step in
developing high-performance Ga2O3-based transistors. Distinct from bulk materials, excess …

Dense yttrium oxyfluoride (YOF) coating was successfully deposited by suspension plasma
spraying (SPS) with coaxial feeding. After deposition for 6 min at a plasma power of 105 kW …

Soft lithography allows for the simple and low-cost fabrication of nanopatterns with different
shapes and sizes over large areas. However, the resolution and the aspect ratio of the …

The recently discovered yttrium oxyfluoride (YOF) coating has been found to be a highly
promising plasma-resistant material which can be coated onto the inner wall of the dry …

Our study provides the results of quantum-chemical calculations of the interaction of fluorine
atoms F, as well as CF 2 and CF 3 particles, with the ordered and defective C (1 0 0)-(2× 1) …

In recent years, yttrium oxide coatings prepared by atmospheric plasma spraying (APS)
have been employed extensively in semiconductor processing equipment. Meanwhile …