Mist chemical vapor deposition of crystalline MoS2 atomic layer films using sequential mist supply mode and its application in field-effect transistors
Abstract Molybdenum disulfide (MoS 2) mono/bilayer have been systematically investigated
using atmospheric-pressure mist chemical vapor deposition (mist CVD) from (NH 4) 2 MoS 4 …
using atmospheric-pressure mist chemical vapor deposition (mist CVD) from (NH 4) 2 MoS 4 …
Numerical evaluation of bi-facial ZnO/MoTe 2 photovoltaic solar cells with N-doped Cu 2 O as the BSF layer for enhancing V OC via device simulation
Molybdenum telluride (MoTe2) shows great promise as a solar absorber material for
photovoltaic (PV) cells owing to its wide absorption range, adjustable bandgap, and lack of …
photovoltaic (PV) cells owing to its wide absorption range, adjustable bandgap, and lack of …
Mist chemical vapor deposition of Al1− xTixOy thin films and their application to a high dielectric material
We investigated the synthesis of amorphous aluminum titanium oxide Al 1− x Ti x O y thin
films from a Al (acac) 3 and Ti (acac) 4 mixture using CH 3 OH/H 2 O as a solvent through …
films from a Al (acac) 3 and Ti (acac) 4 mixture using CH 3 OH/H 2 O as a solvent through …
Dense Al2O3 films prepared by high power impulse magnetron sputtering at pulsed kV bias
D Yang, Y Liu, X Zhang, S Chen, X Wang, Y Liao, X An… - Thin Solid Films, 2025 - Elsevier
Al 2 O 3 films are often used in electronic and other devices for surface protection due to
their excellent insulating and mechanical properties, but these properties depend on the film …
their excellent insulating and mechanical properties, but these properties depend on the film …
AlOx Thin Films Synthesized by Mist Chemical Vapor Deposition, Monitored by a Fast-Scanning Mobility Particle Analyzer, and Applied as a Gate Insulating Layer in …
We investigated the synthesis of aluminum oxide (AlO x) thin films using mist chemical vapor
deposition (mist-CVD) from aluminum acetylacetonate (Al (acac) 3) and methanol/water …
deposition (mist-CVD) from aluminum acetylacetonate (Al (acac) 3) and methanol/water …
Spatial and Size Distributions of Ti(C5H7O2)2[(CH3)2CHO]2 Mist Particles in a Tubular Furnace for Conformal and Uniform Deposition of Amorphous TiO2 …
A Kuddus, T Sato, K Yokoyama… - physica status solidi (a …, 2024 - Wiley Online Library
The spatial and size distributions of titanium diisopropoxide bisacetylacetonate [(C5H7O2) 2
[(CH3) 2CHO] 2, also known as Ti (acac) 2 (OiPr) 2] mist, diluted in CH3OH, are investigated …
[(CH3) 2CHO] 2, also known as Ti (acac) 2 (OiPr) 2] mist, diluted in CH3OH, are investigated …
Mesh Bias Controlled Synthesis of TiO2 and Al0.74Ti0.26O3 Thin Films by Mist Chemical Vapor Deposition and Applications as Gate Dielectric Layers for Field …
K Yokoyama, A Kuddus, MF Hossain… - ACS Applied Electronic …, 2022 - ACS Publications
The effect of applying a mesh bias during the syntheses of amorphous titanium oxide (a-
TiO2) thin films via mist chemical vapor deposition (mist-CVD) was investigated. When a …
TiO2) thin films via mist chemical vapor deposition (mist-CVD) was investigated. When a …
[PDF][PDF] Toward Anode-Free Lithium-Ion Battery Using Amorphous Titanium Oxide Thin Films by Atmospheric-Pressure Mist Chemical Vapor Deposition
H Fukushima, H Shirai, H Sone, H Kurihara, T Ohno… - 2025 - preprints.org
We demonstrate the potential of Lithium titanate (LiTiO) and amorphous titanium oxide (a-
TiOx) thin films synthesized from titanium diisopropoxide bis acetylacetonate C16H28O6Ti …
TiOx) thin films synthesized from titanium diisopropoxide bis acetylacetonate C16H28O6Ti …
The Impact of Silicon Surface Pretreatment on Interface Structure and Passivation Quality of Alox Films Deposited by Atomic Layer Deposition
J Xu, W Zhang, Y Li, C Liu, G Zhang, Z Shen… - Available at SSRN … - papers.ssrn.com
The initial state of silicon surface prior to aluminum oxide (AlOx) films by atomic layer
deposition (ALD) plays a critical role in determining the passivation performance. However …
deposition (ALD) plays a critical role in determining the passivation performance. However …
Dense Al2o3 Films Prepared by High Power Impulse Magnetron Sputtering at Pulsed Kv Bias
Z Wu, D Yang, Y Liu, X Zhang, S Chen, X Wang… - Available at SSRN … - papers.ssrn.com
Al2O3 films are often used in electronic and other devices for surface protection due to their
excellent insulating and mechanical properties, but these properties depend on the film …
excellent insulating and mechanical properties, but these properties depend on the film …