Arrays of nanoparticles exploited in light scattering applications commonly only feature
either a periodic or a rather random arrangement of its constituents. For the periodic case …

To exploit the exceptional properties of diamond, new high quality fabrication techniques are
needed to produce high performing devices. Etching and patterning diamond to depths …

Sapphire has many optical applications in nanophotonics and optoelectronic devices due to
its high index, broadband transparency, and chemical and physical stability. However …

A first-principles density functional theory study has been carried out to investigate the
etching and corrosion of aluminum with fluorine-based plasma. Aluminum is modeled with …

Fabrication of nanostructures on sapphire surfaces can enable unique applications in
nanophotonics, optoelectronics, and functional transparent ceramics. However, the high …

In this study, the etch properties of $ Al_2O_3 $ thin films deposited by atomic layer
deposition were investigated as a function of the $ O_2 $ content in $ BCl_3 $/Ar inductively …

The outstanding material properties of single-crystal diamond have been the origin of the
long-standing interest in its exploitation for engineering of high-performance micro-and …

The realization of vertical GaN devices requires deep plasma etching and is contingent on
high mask selectivity. In this work, we show that SiO2 can be an effective mask material for …

摘要采用图形化蓝宝石衬底(PSS) 技术可以降低GaN 外延层材料位错密度,
提高了发光二极管(LED) 的内量子效率(IQE), 同时使LED 光析出率(LEE) 提高. 基于PSS …

In this study, the etching of sapphire nanostructures in inductively coupled plasma reactive
ion etching using a multilayer etch mask is studied. The goals are to increase the etching …