In this paper, samples of tantalum with purities of 99.99%(0.58 mm thickness) were
implanted by Nitrogen ions. The ions' implantation process was performed at 30 keV and …

In this work to investigate the effects of using different gases in cold atmospheric plasma
(CAP) on surface treatment of silver thin films (100, 120 nm film thickness) He and Ar were …

High melting point refractory tantalum (Ta) metal is frequently grown into thin film layer for
many applications in biomedical implants, microelectronic devices and micro-level …

In the present study, the microstructural and statistical properties of unimplanted in
comparison to argon ion-implanted tantalum-based thin film surface structures are …

Tantalum bulk were implanted with nitrogen ions at different dose of 1× 1 0 1 7 ions/cm2 to 1
0× 1 0 1 7 ions/cm2 and at a energy 30 keV. The implanted samples were characterized …

The aim of present paper was to improve the anticorrosive properties of tantalum. Herein,
the formation of tantalum oxide film via an argon ion etching pretreatment step and anodic …

Abstract Y128-and Y36-cut single-crystalline lithium niobate (LN) thin films are fabricated by
the crystal-ion-slicing (CIS) technique onto LN substrates. The conditions for the successful …

In the last decades an extensive number of research papers published on Nano chip
electrode and cathode electrochromic materials. The surface bombardment with inert gases …

Additive manufacturing (AM) indicated great technological increase in the last years.
Primarily development of new methods, new computer softwares and more useable …

In this work, effects of laser irradiation on several characteristics of vanadium (99.999%) are
examined. The square-shaped vanadium samples were irradiated using pulsed Nd: YAG …