Plasma-chemical reactions: low pressure acetylene plasmas

J Benedikt - Journal of Physics D: Applied Physics, 2010 - iopscience.iop.org
Reactive plasmas are a well-known tool for material synthesis and surface modification.
They offer a unique combination of non-equilibrium electron and ion driven plasma …

Quadrupole mass spectrometry of reactive plasmas

J Benedikt, A Hecimovic, D Ellerweg… - Journal of Physics D …, 2012 - iopscience.iop.org
Reactive plasmas are highly valued for their ability to produce large amounts of reactive
radicals and of energetic ions bombarding surrounding surfaces. The non-equilibrium …

Oxygen discharges diluted with argon: dissociation processes

JT Gudmundsson… - Plasma Sources Science …, 2007 - iopscience.iop.org
We use a global (volume averaged) model to study the dissociation processes and the
presence of negative ions and metastable species in a low pressure high density O 2/Ar …

Characterization of the effluent of a He/O2 microscale atmospheric pressure plasma jet by quantitative molecular beam mass spectrometry

D Ellerweg, J Benedikt, A von Keudell… - New Journal of …, 2010 - iopscience.iop.org
The effluent of a microscale atmospheric pressure plasma jet (μ-APPJ) operated in helium
with a small admixture of molecular oxygen (< 1.6%) has been analyzed by means of two …

Actinometry of O, N and F atoms

DV Lopaev, AV Volynets, SM Zyryanov… - Journal of Physics D …, 2017 - iopscience.iop.org
The applicability of actinometry for measuring the absolute concentration of O, N and F
atoms in discharge plasma was studied. For this purpose, concentrations of these atoms …

Nanoscale deposition of chemically functionalised films via plasma polymerisation

A Michelmore, DA Steele, JD Whittle, JW Bradley… - Rsc Advances, 2013 - pubs.rsc.org
Plasma polymerisation is a technologically important surface engineering process capable
of depositing ultra-thin functionalised films for a variety of purposes. It has many advantages …

Relation of the Si H stretching frequency to the nanostructural Si H bulk environment

AHM Smets, MCM Van De Sanden - Physical Review B—Condensed Matter …, 2007 - APS
We propose a model which describes the frequency shift (Δ ω SM) of the stretching mode
(SM) of Si H monohydrides (MH's) when incorporated in hydrogenated amorphous silicon …

Mass spectrometry of atmospheric pressure plasmas

S Große-Kreul, S Hübner, S Schneider… - Plasma Sources …, 2015 - iopscience.iop.org
Atmospheric pressure non-equilibrium plasmas (APPs) are effective source of radicals,
metastables and a variety of ions and photons, ranging into the vacuum UV spectral region …

Hydrogen Stability and Bonding in SiNx and Al2O3 Dielectric Stacks on Poly-Si/SiOx Passivating Contacts

MB Hartenstein, W Nemeth, DL Young… - ACS Applied Energy …, 2023 - ACS Publications
Polycrystalline Si on SiO x passivating contacts enables some of the highest efficiency
single-junction Si photovoltaic devices, but the high-temperature firing process needed for …

Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges

OV Proshina, TV Rakhimova, AI Zotovich… - Plasma Sources …, 2017 - iopscience.iop.org
Low-pressure RF plasma in fluorohydrocarbon gas mixtures is widely used in modern
microelectronics, eg in the etching of materials with a low dielectric constant (low-k) …