Cross-linked poly (dimethylsiloxane)(PDMS) was irradiated with a Xe2*-excimer lamp (172
nm) under ambient conditions. The irradiation in combination with the formed ozone results …

This volume presents a complete and thorough examination of advances in the
instrumentation, evaluation, and implementation of UV technology for reliable and efficient …

The amount of absorbed light in thin photoresist films is a key parameter in photolithographic
processing, but its experimental measurement is not straightforward. The optical absorption …

The development of environmentally friendly materials and processes is a major issue that
concerns all industrial sectors, including microelectronics. The aim of this study is to …

The plasma modification of polydimethylsiloxane (PDMS) thin films was studied by means of
Fourier Transform Infrared Reflection Absorption Spectroscopy (FT‐IRRAS). The spin …

The surface properties of silicone rubber can be modified by irradiation with light from the
vacuum ultraviolet (VUV) spectral range of less than 200 nm. After VUV-irradiation at 185 nm …

A two-step UV curing process of thin acrylate layers was employed to prepare micro-rough
top-coats on polymer film. The concept of the process (known as “photonic micro-folding”) is …

Laser irradiation at 157nm of polymethylmethacrylate (PMMA) thin films induces major
variations of polymer film thicknesses from sorption (absorption/desorption) of methanol and …

Copolymers containing polyhedral oligomeric silsesquioxane (POSS™) units have been
developed to be used as photoresist components in a bilayer resist scheme for 193 nm …

We investigated the resistance of a low-k SiOCH film structure to plasma-irradiation damage
by comparing films deposited by neutral-beam enhanced chemical-vapour-deposition …