Vapor-Phase Halogenation of Hydrogen-Terminated Silicon(100) Using N-Halogen-succinimides

PR Raffaelle, GT Wang… - ACS Applied Materials & …, 2023 - ACS Publications
The focus of this study was to demonstrate the vapor-phase halogenation of Si (100) and
subsequently evaluate the inhibiting ability of the halogenated surfaces toward atomic layer …

Selective regulation of Pt clusters inside KY zeolite using atomic layer deposition for n-octane reforming

M Yan, D Xu, S Wang, B Wu, Y Yang, Y Li - Fuel, 2022 - Elsevier
Engineering the chemical environment of active metal phase plays vital role for the alkane
reforming, yet great challenges remain. Herein, ABC-type atomic layer deposition (ALD) with …

[PDF][PDF] Area-Selective Atomic Layer Deposition and Area-Selective Etching for Self-aligned Patterning

C Zhang - 2023 - helda.helsinki.fi
Self-aligned thin film patterning has become a critical technique for the manufacturing of
advanced semiconductor devices. The great benefit of the selfalignment is to reduce the …

Application and Patterning of Atomic and Small-Molecule Resists for Area-Selective Deposition on Silicon

PR Raffaelle - 2024 - search.proquest.com
The fabrication of 2D devices with micro/nano-scale features often rely on assembly from a
top-down perspective, where the design emphasis is on the removal of material to generate …

Recent Studies on Area Selective Atomic Layer Deposition of Elemental Metals

MG Cho, JH Go, BJ Choi - Journal of Powder Materials, 2023 - koreascience.kr
The semiconductor industry faces physical limitations due to its top-down manufacturing
processes. High cost of EUV equipment, time loss during tens or hundreds of …

단일원소금속의영역선택적원자층증착법연구동향

조민규, 고재희, 최병준 - 한국분말야금학회지, 2023 - dbpia.co.kr
The semiconductor industry faces physical limitations due to its top-down manufacturing
processes. High cost of EUV equipment, time loss during tens or hundreds of …