High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

Excitonic mechanisms of defect formation and of sputtering from surfaces, induced as a
consequence of exciton relaxation, are effective in a limited class of wide-gap materials …

This review focuses on a status report on the science and technology of ultrananocrystalline
diamond (UNCD) films developed and patented at Argonne National Laboratory. The UNCD …

Properties of thin films depend strongly upon the deposition technique and conditions
chosen. In order to achieve the desired film, optimum deposition conditions have to be found …

Laser sputtering differs from ion sputtering mainly in the important role played by thermal
effects. These include not only vaporization from the extreme outer surface and boiling from …

When a biological system encounters an implant, reactions are induced at the implant-tissue
interface. This article deals with various surface properties that are expected to influence …

During the past century, there have been hundreds of manuscripts published reporting
different aspects of sputtering. The purpose of this article is to summarize the trends …

Energetic ion bombardment of solid targets can lead to the production of atomic recoils and
defects within the solid and the ejection or sputtering of atoms from the surface with the …

Doping of W into VO2 was done by high-energy (1.0 MeV) ion beam implantation and
thermal annealing for the first time. The implantation was performed with different ion doses …