Nanoscale metallic multilayers have been shown to have a wide range of outstanding
properties, which differ to a great extent from those observed in monolithic films. Their …

The article provides a review of the current state of affairs in the field of physics and
technology of multilayer beryllium-containing mirrors intended for projection lithography and …

We study theoretically and experimentally the increase of normal incidence reflectivity
generated by addition of a third material in the period of a standard periodic multilayer, for …

We report on the development of multilayer optics for the extreme ultra-violet (EUV) range.
The optical performance of Al-based multilayer mirrors is discussed with regard to promising …

The influence of Mo interlayers on the microstructure of films and boundaries, and the
reflective characteristics of Ru/Be multilayer mirrors (MLM) were studied by X-ray …

Chirped Mo/Si multilayer coatings have been designed, fabricated, and characterized for
use in extreme-ultraviolet attosecond experiments. By numerically simulating the reflection …

Scattering resulting from interface imperfections critically affects the image contrast and
optical throughput of multilayer coatings for 13.5 nm. To investigate the scattering …

At Laser-Laboratorium Göttingen laser-plasma sources were tested, which are going to be
used for characterization of optical components and sensoric devices in the wavelength …

High reflectivity and long-term stability in multilayer mirrors (MLMs) are crucial for extreme
ultraviolet (EUV) photolithography. The conventional base stack to reflect 13.5 nm light is a …

Sub-quarterwave multilayer coatings with more than two different materials are shown to
provide a reflectance enhancement compared with the standard two-material multilayer …