Interplay between oxygen defects and dopants: effect on structure and performance of HfO 2-based ferroelectrics

M Materano, PD Lomenzo, A Kersch… - Inorganic Chemistry …, 2021 - pubs.rsc.org
Ten years after the first report on ferroelectricity in HfO2, researchers are still occupied
unraveling the different causes behind this phenomenon. Among them, oxygen related …

Dielectric breakdown of oxide films in electronic devices

A Padovani, P La Torraca, J Strand, L Larcher… - Nature Reviews …, 2024 - nature.com
Dielectric breakdown is a sudden and catastrophic increase in the conductivity of an
insulator caused by electrical stress. It is one of the major reliability issues in electronic …

The influence of top and bottom metal electrodes on ferroelectricity of hafnia

Y Lee, Y Goh, J Hwang, D Das… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
In recent years, several experimental approaches have been adopted to study and
understand the mechanism and improve the ferroelectricity of fluorite-type hafnia-based …

Demonstration of synaptic and resistive switching characteristics in W/TiO2/HfO2/TaN memristor crossbar array for bioinspired neuromorphic computing

M Ismail, U Chand, C Mahata, J Nebhen… - Journal of Materials …, 2022 - Elsevier
In this study, resistive random-access memory (RRAM)-based crossbar arrays with a
memristor W/TiO 2/HfO 2/TaN structure were fabricated through atomic layer deposition …

Improving linearity by introducing Al in HfO2 as a memristor synapse device

S Chandrasekaran, FM Simanjuntak… - …, 2019 - iopscience.iop.org
Artificial synapse having good linearity is crucial to achieve an efficient learning process in
neuromorphic computing. It is found that the synaptic linearity can be enhanced by …

Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide

J Lee, K Yang, JY Kwon, JE Kim, DI Han, DH Lee… - Nano …, 2023 - Springer
HfO2 shows promise for emerging ferroelectric and resistive switching (RS) memory devices
owing to its excellent electrical properties and compatibility with complementary metal oxide …

Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems

C Mahata, C Lee, Y An, MH Kim, S Bang… - Journal of Alloys and …, 2020 - Elsevier
This work reports on the bipolar resistive switching (RS) characteristics and possible
applicability to transparent synaptic devices when an ultrathin Al 2 O 3 interfacial layer is …

Interface-engineered reliable HfO 2-based RRAM for synaptic simulation

Q Wang, G Niu, S Roy, Y Wang, Y Zhang… - Journal of Materials …, 2019 - pubs.rsc.org
Future synaptic simulation using resistance random access memory (RRAM) requires higher
reliability and lower power consumption of the devices and understanding of the correlation …

Improved memory performance of ALD grown HfO2 films by nitrogen doping

J Aziz, MF Khan, D Neumaier, M Ahmad, H Kim… - Materials Science and …, 2023 - Elsevier
Resistive switching devices have shown potential in storage class memory and artificial
intelligence applications but however, it faces drastic limitations due to low endurance, bad …

Resistive Switching Characteristics of HfO2 Thin Films on Mica Substrates Prepared by Sol-Gel Process

CF Liu, XG Tang, LQ Wang, H Tang, YP Jiang, QX Liu… - Nanomaterials, 2019 - mdpi.com
The resistive switching (RS) characteristics of flexible films deposited on mica substrates
have rarely been reported upon, especially flexible HfO2 films. A novel flexible …