[HTML][HTML] Bandgap engineering in III-nitrides with boron and group V elements: Toward applications in ultraviolet emitters

R Kudrawiec, D Hommel - Applied Physics Reviews, 2020 - pubs.aip.org
A key material system for opto-and high-power electronics are III-nitrides. Their functionality
can be expanded when bandgap engineering is extended beyond common materials such …

Natural band alignment of BAlN and BGaN alloys

Y Ota, M Imura, RG Banal, Y Koide - Journal of Physics D …, 2022 - iopscience.iop.org
The natural band alignment of BAlN and BGaN alloys was investigated using the atomic
solid-state energy scale approach. The band edge positions relative to the vacuum level …

Phase degradation in BxGa1− xN films grown at low temperature by metalorganic vapor phase epitaxy

BP Gunning, MW Moseley, DD Koleske… - Journal of Crystal …, 2017 - Elsevier
Using metalorganic vapor phase epitaxy, a comprehensive study of B x Ga 1− x N growth on
GaN and AlN templates is described. BGaN growth at high-temperature and high-pressure …

The lattice-matched AlInN/GaN high electron mobility transistor with BGaN buffer

L Geng, H Zhao, T Han, X Ren - Solid State Communications, 2021 - Elsevier
This work studies the lattice-matched AlInN/GaN high-electron mobility transistor (HEMT)
with BGaN buffer in drain-current (DC) and radio-frequency (RF) characteristics in theory …

Thermodynamics of boron incorporation in BGaN

JX Shen, ME Turiansky, D Wickramaratne… - Physical Review …, 2021 - APS
We study the thermodynamics of boron (B) incorporation into gallium nitride (GaN) using first-
principles calculations. In the dilute limit, we have calculated the formation energies of …

Optical and structural properties of BGaN layers grown on different substrates

A Kadys, J Mickevičius, T Malinauskas… - Journal of Physics D …, 2015 - iopscience.iop.org
Growth of BGaN epitaxial layers by metalorganic chemical vapor deposition (MOCVD) using
triethylboron (TEB) as a boron source was studied on 6H-SiC substrate and on GaN and AlN …

Morphology and carrier mobility of high-B-content B x Al 1− x N ternary alloys from an ab initio global search

Z Qi, Z Shi, H Zang, X Ma, Y Yang, Y Jia, K Jiang… - Nanoscale, 2022 - pubs.rsc.org
The excellent properties of III-nitrides and their alloys have led to significant applications in
optoelectronic devices. Boron, the lightest IIIA group element, makes it possible to extend …

Insights on boron impact on structural characteristics in epitaxially grown BGaN

EB Możdżyńska, S Złotnik, P Ciepielewski… - Journal of Materials …, 2022 - Springer
It is shown that MOCVD growth allows to obtain BGaN epitaxial layers at growth temperature
(T gr) between 840 and 1090° C. It is found that morphology of the epitaxial layers and …

[HTML][HTML] Growth of coherent BGaN films using BBr3 gas as a boron source in plasma assisted molecular beam epitaxy

RC Cramer, B Bonef, J English, CE Dreyer… - Journal of Vacuum …, 2017 - pubs.aip.org
Incorporating boron into gallium nitride to make B x Ga 1-x N solid solutions would create an
avenue for extreme alloys due to the fact that wurtzite phase BN has a larger band gap and …

The effects of low boron incorporation on the structural and optical properties of BxGa1− xN/SiC epitaxial layers

C Romanitan, J Mickevičius, F Comanescu… - Applied …, 2024 - journals.iucr.org
BGaN epilayers with boron contents up to 5.6% were grown on SiC substrates by metal–
organic chemical vapor deposition. The effects of boron incorporation on the structural and …