B Abendroth, T Moebus, S Rentrop, R Strohmeyer… - Thin Solid Films, 2013 - Elsevier
The atomic layer deposition (ALD) of TiO 2 from tetrakis (dimethylamino) titanium (TDMAT)
and water was studied in the substrate temperature (TS) range of 120° C to 330° C. The …