Surface termination and interfacial interactions are critical for advanced solid-state quantum
applications. In this paper, we demonstrate that atomic layer deposition (ALD) can both …

Unique atomic arrangements (ie, defects) on material surfaces may exhibit distinctive
reactivity that affords opportunities for selective surface chemistry exclusively at those sites …

Anatase TiO2 nanoparticles support a subtle diversity of surface aqua and hydroxy
coordination environments that are characteristic of distinct facets and defect sites. The …

Routes to area-and especially site-selective atomic layer deposition (ALD) remain an
enticing challenge in precision surface science, despite the potentially game-changing …

This article is based on the MRS Medal presentation given by Delia J. Milliron at the 2023
MRS Fall Meeting & Exhibit in Boston, Mass. Milliron is cited “for the development of optically …

In situ pyroelectric calorimetry and spectroscopic ellipsometry were used to investigate
surface reactions in atomic layer deposition (ALD) of zirconium oxide (ZrO2). Calibrated and …

Area-selective atomic layer deposition (AS-ALD) is a bottom-up fabrication technique that
may revolutionize the semiconductor manufacturing process. Because the efficiency and …

The resonant frequency of plasmonic nanoparticles depends on the refractive index of the
local environment, a property which is directly useful for sensing applications and is …

While atomic layer deposition (ALD) processes from across the periodic table have been
designed to deposit conformal thin films, an atomistic view of disparate substrate sites …

The utility of atomic layer deposition (ALD) continues to expand beyond conformal thin-film
fabrication to include area-or site-selective ALD. We previously identified a strategy for site …