Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application

C Cummins, T Ghoshal, JD Holmes… - Advanced …, 2016 - Wiley Online Library
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …

Influence of Molecular Architecture and Chain Flexibility on the Phase Map of Polystyrene-block-poly(dimethylsiloxane) Brush Block Copolymers

HF Fei, BM Yavitt, X Hu, G Kopanati, A Ribbe… - …, 2019 - ACS Publications
We report the microphase-separated morphologies of model bottlebrush block copolymers
(BBCPs) over a wide range of architectural design parameters. Densely grafted polystyrene …

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte, S Ndoni… - Journal of colloid and …, 2019 - Elsevier
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …

Fabrication of Stable Liquid-like Wetting Buckled Surfaces as Bioinspired Antibiofouling Coatings by Using Silicon-Containing Block Copolymers

TL Chen, CY Huang, YS Lai, YC Chen… - … Applied Materials & …, 2024 - ACS Publications
Inspired by animals with a slippery epidermis, durable slippery antibiofouling coatings with
liquid-like wetting buckled surfaces are successfully constructed in this study by combining …

High quality sub-10 nm graphene nanoribbons by on-chip PS-b-PDMS block copolymer lithography

S Rasappa, JM Caridad, L Schulte, A Cagliani… - Rsc Advances, 2015 - pubs.rsc.org
A block copolymer self-assembly holds great promise as a rapid, cheap and scalable
approach to nanolithography. We present a straightforward method for fabrication of sub-10 …

Micrometer-scale ordering of silicon-containing block copolymer thin films via high-temperature thermal treatments

TJ Giammaria, F Ferrarese Lupi… - … applied materials & …, 2016 - ACS Publications
Block copolymer (BCP) self-assembly is expected to complement conventional optical
lithography for the fabrication of next-generation microelectronic devices. In this regard …

[HTML][HTML] Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing

X Cheng, J Tempeler, S Danylyuk, A Böker, L Tsarkova - Polymers, 2024 - mdpi.com
The microphase separation of high-molecular-weight block copolymers into nanostructured
films is strongly dependent on the surface fields. Both, the chain mobility and the effective …

Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

S Rasappa, L Schulte, D Borah, H Hulkkonen… - Microelectronic …, 2018 - Elsevier
Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2 kb-11.7 k,
SD39) block copolymer having a total molecular weight of 39 kg mol− 1 was exploited to …

Fast & scalable pattern transfer via block copolymer nanolithography

T Li, Z Wang, L Schulte, O Hansen, S Ndoni - Rsc Advances, 2015 - pubs.rsc.org
A fully scalable and efficient pattern transfer process based on block copolymer (BCP) self-
assembling directly on various substrates is demonstrated. PS-rich and PDMS-rich poly …

Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators

S Rasappa, L Schulte, S Ndoni, T Niemi - Nanoscale, 2018 - pubs.rsc.org
In this paper, we report on the fabrication of optical nanoresonators using block copolymer
lithography. The nanostructured gratings or nanofins were fabricated using a silicon …