Sub-10 nm fabrication: methods and applications

Y Chen, Z Shu, S Zhang, P Zeng, H Liang… - … Journal of Extreme …, 2021 - iopscience.iop.org
Reliable fabrication of micro/nanostructures with sub-10 nm features is of great significance
for advancing nanoscience and nanotechnology. While the capability of current …

Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

IW Rangelow, T Ivanov, A Ahmad… - Journal of Vacuum …, 2017 - pubs.aip.org
With the recent advances in the field of nanotechnology, measurement and manipulation
requirements at the nanoscale have become more stringent than ever before. In atomic force …

[HTML][HTML] Crafting at the nanoscale: A comprehensive review of mechanical Atomic force microscopy-based lithography methods and their evolution

L Vincenti, P Pellegrino, M Cascione, V De Matteis… - Materials & Design, 2024 - Elsevier
In recent years, the scientific community's interest in nanoscience and nanotechnology
stems from the increasing capability to manipulate matter at the nanoscale. Nanotechnology …

Advanced scanning probe nanolithography using GaN nanowires

M Behzadirad, S Mecholdt, JN Randall, JB Ballard… - Nano Letters, 2021 - ACS Publications
A fundamental understanding and advancement of nanopatterning and nanometrology are
essential in the future development of nanotechnology, atomic scale manipulation, and …

Field emission from diamond nanotips for scanning probe lithography

M Hofmann, C Lenk, T Ivanov, IW Rangelow… - Journal of Vacuum …, 2018 - pubs.aip.org
Single-digit nanometer lithography is a basic requirement for beyond CMOS devices. To
address this lithography challenge, a variety of different lithographic methods were …

Overview of materials and processes for lithography

RA Lawson, APG Robinson - Frontiers of nanoscience, 2016 - Elsevier
Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

M Kaestner, C Aydogan, T Ivanov… - Journal of Micro …, 2015 - spiedigitallibrary.org
The routine “on demand” fabrication of features smaller than 10 nm opens up new
possibilities for the realization of many devices. Driven by the thermally actuated …

Front-mediated melting of isotropic ultrastable glasses

E Flenner, L Berthier, P Charbonneau, CJ Fullerton - Physical review letters, 2019 - APS
Ultrastable vapor-deposited glasses display uncommon material properties. Most
remarkably, upon heating they are believed to melt via a liquid front that originates at the …

Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers

M Fernández-Regúlez, L Evangelio… - … applied materials & …, 2014 - ACS Publications
The creation of highly efficient guiding patterns for the directed self-assembly of block
copolymers by resistless nanolithography using atomic force microscopy (AFM) is …

Low-energy electron exposure of ultrathin polymer films with scanning probe lithography

Y Krivoshapkina, M Kaestner, C Lenk, S Lenk… - Microelectronic …, 2017 - Elsevier
Scanning probe lithography (SPL) describes a group of patterning techniques, wherein
localized tip-sample interactions are utilized in order to directly or indirectly (via a resist film) …