Silicon microelectronics, consisting of complementary metal–oxide–semiconductor technology, have changed nearly all aspects of human life from communication to …
Aluminum scandium nitride (Al1–x Sc x N), with its large remanent polarization, is an attractive material for high-density ferroelectric random-access memories. However, the …
Non-volatile memory devices that can operate reliably at high temperature are required for the development of extreme environment electronics. However, creating such devices …
Commercial production of integrated photonic devices is limited by scalability of desirable material platforms. We explore a relatively new photonic material, AlScN, for its use in …
This work reports a millimeter wave (mmWave) thin-film bulk acoustic resonator (FBAR) in sputtered scandium aluminum nitride (ScAlN). This paper identifies challenges of frequency …
Low-energy compute-in-memory architectures promise to reduce the energy demand for computation and data storage. Wurtzite-type ferroelectrics are promising options for both …
Aluminum scandium nitride (AlScN) has emerged as a promising candidate for next‐ generation ferroelectric memories, offering a much higher remanent charge density than …
This Letter presents oriented growth and switching of thin (∼ 30 nm) co-sputtered ferroelectric (FE) aluminum scandium nitride (AlScN) films directly on degenerately doped …
Despite the considerable potential and significant promise of aluminum scandium nitride (AlScN) ferroelectric materials for neuromorphic computing applications, challenges related …