Drug delivery is a key component of nanomedicine, and conventional delivery relies on the
adsorption or encapsulation of drug molecules to a nanomaterial. Many delivery vehicles …

Synthesis of two novel tin carboxylate clusters (RSn) 6 (R′ CO2) 8O4Cl2 is described, and
their structures have been characterized by X-ray diffraction. These clusters have irregular …

Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor
manufacturing, enabling the creation of high-resolution patterns essential for advanced …

Inorganic resists have emerged as promising candidates in semiconductor industries to
realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films …

The tin-oxo cage ([R12Sn12O14 (OH) 6] 2+) is an excellent photoresist candidate in extreme
ultraviolet lithography (EUVL). Photoionization that leads to plenty of photoelectrons and …

Organometallic tin-oxo-hydroxo cage compounds offer a promising photoresist platform for
extreme ultraviolet photolithography (EUVL). Their reactivity is dominated by the facile …

抄録 Hybrid organic/inorganic materials are considered as the Extreme Ultraviolet
photoresists of the future. Compared to chemically amplified polymer-based photoresists …

The semiconductor industry is currently transitioning to advanced extreme-ultraviolet
lithography (EUVL) to address the challenges facing the use of photolithography in …

The high-volume production of semiconductor devices with EUV lithography started in 2019.
During the development of EUV lithography, the resist materials had always been ranked …

Extreme Ultraviolet Lithography photoresists undergo chemical reactions initiated by
ionizing radiation. Understanding the decay pathways in the photoresist following …